GB/T 30856-2025GaAs substrates for LED epitaxial chips (English PDF)
LED外延芯片用砷化镓衬底
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Issued by
SAMR; SAC
Level / Type
National · Recommended
Issue date
August 1, 2025
Implementation date
February 1, 2026
Scope
GB/T 30856-2025 is the English-translated version of LED外延芯片用砷化镓衬底.
GB/T 30856-2025 is the Chinese national standard covering the gallium arsenide wafer an LED epitaxial layer is grown on — the n-type and p-type grades and the five diameters from 50.8 mm to 200 mm, the electrical properties, the reference flat and the notch that orient the wafer in the reactor, the surface crystal orientation and its deviation, the dislocation density, the geometric dimensions, the surface quality, and the inspection rules. Issued on 1 August 2025, it has been in force since 1 February 2026, replacing GB/T 30856-2014.
Document preview — GB/T 30856-2025
National Standard of the People's Republic of China
- ICS
- 29.045
- Classification
- H 83
- Replacing
- GB/T 30856-2014
Issued by: State Administration for Market Regulation; Standardization Administration of the PRC
Contents
- Foreword
- 1 Scope
- 2 Normative references
- 3 Terms and Definitions
- 4 Classification and brand
- 4.1 Classification
Foreword
This document is in accordance with the provisions of GB/T 1.1-2020 "Guidelines for standardization work Part 1: Structure and drafting rules for standardization documents" Drafting.
This document replaces GB/T 30856-2014 "GaAs substrates for LED epitaxial chips".
In addition to structural adjustments and editorial changes, the main technical changes are as follows.
a) The specifications have been changed (see 4.1.2, 4.3 of the 2014 edition);
b) The requirements for electrical performance have been changed (see 5.1, 4.4 of the 2014 edition);
c) The requirements for reference surfaces and cutouts have been changed (see 5.2, 4.4 of the 2014 edition);
d) Changed the requirements for surface crystal orientation and crystal orientation deviation (see 5.3, 4.5 of the 2014 edition);
e) Changed the requirements for dislocation density (see 5.4, 4.6 of the 2014 edition);
f) The geometric dimension requirements have been changed (see 5.5, 4.9 of the 2014 edition);
g) Changed the surface quality requirements (see 5.6, 4.7 of the 2014 edition);
h) The test method for electrical properties has been changed (see 5.2, 4.8 of the 2014 edition);
i) The inspection method for incisions has been changed (see 6.2.3, 5.5.2 of the 2014 edition);
j) The inspection rules have been changed (see Chapter 7, Chapter 6 of the 2014 edition);
k) The logo has been changed (see 8.1, 7.1 of the 2014 edition);
l) The packaging has been changed (see 8.2, 7.2 of the 2014 edition);
m) Deleted the method of measuring substrate resistivity using a sheet resistance meter and the method of measuring substrate room temperature carrier concentration and mobility.
Method (see Appendices A and B of the 2014 edition).
Please note that some of the contents of this document may involve patents. The issuing organization of this document does not assume the responsibility for identifying patents.
This document was jointly issued by the National Technical Committee on Semiconductor Equipment and Materials Standardization (SAC/TC203) and the National Technical Committee on Semiconductor Equipment and Materials Standardization (SAC/TC203).
It is jointly proposed and coordinated by the Materials Subcommittee of the Chemical Technology Committee (SAC/TC203/SC2).
This document was drafted by: Nanjing Jiyi Semiconductor Technology Co., Ltd., Zhongshan Dehua Chip Technology Co., Ltd., Guangdong Pioneer Microelectronics Technology Co., Ltd.
Technology Co., Ltd., Quanlei Optoelectronics Co., Ltd., Shandong Inspur Huaguang Optoelectronics Co., Ltd., Yunnan Xinyao Semiconductor Materials Co., Ltd.
Dongguan Institute of Optoelectronics, Peking University, Institute of Semiconductors, Chinese Academy of Sciences, Daqing Yitai Semiconductor Materials Co., Ltd., and Easystar Optoelectronics (Guangdong) Co., Ltd., Shenzhen Guanke Technology Co., Ltd., and Guangdong Zhongyang Optoelectronics Technology Co., Ltd.
The main drafters of this document are: Zhao Zhongyang, Zheng Hongjun, Feng Jiafeng, Yu Huiyong, Liu Jianqing, Sun Xuefeng, Zhang Shuangxiang, Yan Baohua, Lin Zuoliang, Liu Qiang, Ma Jinfeng, Zhao Youwen, Zhao Chunfeng, Peng Lu, Xu Baozhou, Lan Qing, and Chen Huang.
This document was first published in 2014 and this is the first revision.
1 Scope
This document specifies the technical requirements, test methods, Inspection rules, marking, packaging, transportation, storage and accompanying documents and order form contents.
This document applies to the production, testing and quality evaluation of gallium arsenide single crystal substrates for LED epitaxial chips.
2 Normative references
GB/T 191
GB/T 1555
GB/T 2828.1-2012
GB/T 4326
GB/T 6618
GB/T 6620
GB/T 6621
GB/T 6624
GB/T 8760
GB/T 11093
GB/T 13387
GB/T 13388
GB/T 14140
GB/T 14264
GB/T 14844
GB/T 20228
3 Terms and Definitions
The terms and definitions defined in GB/T 14264 apply to this document.
4 Classification and brand
4.1 Classification
4.1.1 Gallium arsenide substrates are classified into n-type and p-type according to their conductivity type.
4.1.2 GaAs substrates are classified into five sizes based on diameter. 50.8mm, 76.2mm, 100.0mm, 150.0mm, and.200.0mm.
......
This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 15 pages — is available in the English PDF.
Referenced standards
Normative references
- GB/T 191Graphical symbols marking for handling and storage of packages
- GB/T 1555Test methods for determining the orientation of a semiconductive single crystal
- GB/T 2828.1-2012Sampling procedures for inspection by attributes - Part 1: Sampling schemes indexed by acceptance quality limit (AQL) for lot-by-lot inspection
- GB/T 4326Extrinsic semiconductor single crystals - Measurement of Hall mobility and Hall coefficient
- GB/T 6618Test method for thickness and total thickness variation of silicon slices
- GB/T 6621Testing methods for surface flatness of silicon slices
GB/T 6620 · GB/T 13387 · GB/T 13388
Editions of GB/T 30856
| Edition | Title | Revision | Status |
|---|---|---|---|
| GB/T 30856-2025 | GaAs substrates for LED epitaxial chips | current edition | Current |
| GB/T 30856-2014 | GaAs substrates for LED epitaxial chips | previous edition | In force |
This page sells the current edition, GB/T 30856-2025. Earlier editions are listed for reference only.
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Related Standards
GB/T 11093-2007 — Liquid encapsulated czochralski - grown gallium arsenide single crystals and as-cut slices
GB/T 14140-2025 — Test method for measuring diameter of semiconductor wafer
GB/T 14264-2024 — Terminology of semiconductor materials
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