GB/T 34972-2017Determination of metal content in gases—Inductively coupled plasma mass spectrometry method (English PDF)
电子工业用气体中金属含量的测定 电感耦合等离子体质谱法
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Issued by
SAMR; SAC
Level / Type
National · Recommended
Issue date
November 1, 2017
Implementation date
February 1, 2018
Scope
GB/T 34972-2017 is the English-translated version of 电子工业用气体中金属含量的测定 电感耦合等离子体质谱法.
GB/T 34972-2017 is the Chinese method for measuring metallic impurities in the gases used by the electronics industry, by inductively coupled plasma mass spectrometry.
It lists the elements it can determine and the range for each, from 0.0001 µg/L up to 100.0 µg/L for lithium, sodium, titanium, vanadium, manganese, zinc, strontium, yttrium, iridium and gold, and from 0.0005 or 0.001 µg/L for the other metals covered, including the rare earths from cerium to lutetium, hafnium, tantalum, tungsten, platinum and mercury.
It applies to the gases as sampled, among them oxygen, nitrogen, argon, helium, hydrogen, ammonia, hydrogen chloride, silane, high-purity chlorine, sulfur hexafluoride, boron trichloride, nitrogen trifluoride, nitrous oxide, hexafluoroethane and hexafluorobutadiene.
Gas producers and semiconductor material laboratories use it. It was issued on 1 November 2017 and has applied since 1 February 2018.
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Document preview — GB/T 34972-2017
National Standard of the People's Republic of China
- ICS
- 71.040.40
- Classification
- G 86
Issued by: State Administration for Market Regulation; Standardization Administration of the PRC
Contents
- Foreword
- 1 Scope
Foreword
This standard was drafted in accordance with the rules given in GB/T 1.1-2009.
1 Scope
This standard specifies the application of inductively coupled plasma mass spectrometry Determination of metal content in the electronics industry with a method of content. Metal yuan The determination range of the prime is shown in Table 1.
This standard applies to the type of gas used in the electronics industry.Oxygen, nitrogen, argon, helium, hydrogen, ammonia, hydrogen chloride, silane, high purity chlorine, sulfur hexafluoride, trichlorination Boron, nitrogen trifluoride, nitrous oxide, hexafluoroethane, hexafluorobutadiene and other gases.
This standard applies to the electronics industry gas sampling state.
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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 15 pages — is available in the English PDF.
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