GB/T 45459-2025Microbeam analysis — Focused ion beam — Preparation of TEM specimens (English PDF)
微束分析 聚焦离子束 透射电镜试样制备方法
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Issued by
SAMR; SAC
Level / Type
National · Recommended
Issue date
March 28, 2025
Implementation date
October 1, 2025
Scope
GB/T 45459-2025 is the English-translated version of 微束分析 聚焦离子束 透射电镜试样制备方法.
GB/T 45459-2025 is the Chinese national standard covering cutting a transmission electron microscope specimen out of a bulk material with an ion beam — the dual-beam instrument, its basic functions, composition and principle, the environmental and sample requirements, the instrument check, the beam-induced deposition that protects the region of interest, the ion beam etching that frees and thins the specimen until electrons can pass through it, and the log that records how each one was made. First edition, with the three-dimensional rock imaging standard GB/T 45468-2025. In force from 1 October 2025. Issued on 28 March 2025, it has been in force since 1 October 2025.
Document preview — GB/T 45459-2025
National Standard of the People's Republic of China
- ICS
- 71.040.40
- Classification
- G 04
Issued by: State Administration for Market Regulation; Standardization Administration of the PRC
Contents
- PrefaceIII
- 1 Scope1
- 2 Normative references1
- 3 Terms and Definitions1
- 4 Instruments and Equipment2
- 4.1 Basic functions2
- 4.2 Instrument composition3
- 4.3 Instrument Principle3
- 5 Environment and sample requirements3
- 5.1 Environmental Requirements3
- 5.2 Sample requirements4
- 6 Sample preparation4
- 6.1 Instrument Inspection4
- 6.2 Sample and instrument preparation4
- 6.3 Preparation Step5
- 7 Test Log12
- Reference13
Foreword
This document is in accordance with the provisions of GB/T 1.1-2020 "Guidelines for standardization work Part 1: Structure and drafting rules for standardization documents" Drafting.
Please note that some of the contents of this document may involve patents. The issuing organization of this document does not assume the responsibility for identifying patents.
This document was proposed and coordinated by the National Microbeam Analysis Standardization Technical Committee (SAC/TC38).
This document was drafted by: University of Science and Technology Beijing, Tianjin University, Nanjing University, Shougang Group Co., Ltd., Shanghai Jiaotong University, Harbin Institute of Technology Vocational University.
The main drafters of this document are: Qiao Yi, Xu Zongwei, Deng Yu, Meng Yang, Wang Ying, Wang Rongming, Zou Yongchun, You Li, and Zhu Yuchen.
Microbeam analysis Focused ion beam Transmission Electron Microscope Sample Preparation Method
1 Scope
This document specifies the instrumentation, environment and sample requirements, sample preparation and testing for the preparation of transmission electron microscopy samples by the focused ion beam method. Record.
This document is applicable to transmission electron microscopy specimens of metal materials, semiconductors, minerals and other inorganic non-metallic materials, and polymer materials and other solid materials. preparation.
This document is applicable to various types of focused ion beam field emission scanning electron microscope dual-beam systems, single-beam systems and multi-beam systems for reference.
2 Normative references
The contents of the following documents constitute essential clauses of this document through normative references in this document.
For referenced documents without a date, only the version corresponding to that date applies to this document; for referenced documents without a date, the latest version (including all amendments) applies to This document.
JY/T 0583-2020 General rules for analysis methods of focused ion beam systems
3 Terms and definitions
The terms and definitions defined in JY/T 0583-2020 and the following apply to this document.
3.1 [Source. JY/T 0583-2020, 2.1]
The sample surface is bombarded with a focused ion beam, and the scanning or processing trajectory, step length, and dwell time of the ion beam are controlled by a computer.
The system can reduce the time and cycle number to realize the analytical processing system for material imaging, etching, induced deposition and implantation.
3.2 Precursorgas
Contains target elements, in gaseous, volatile liquid or solid form, with chemical thermal stability and corresponding reactivity or physical properties Organic compounds.
3.3
The process of using a focused electron beam to induce the precursor gas to decompose on the sample surface to form a deposit.
3.4 [Source. JY/T 0583-2020, 2.2, modified]
The process of using a focused ion beam to induce the precursor gas to decompose on the sample surface to form solid matter.
3.5 Ion beam etching
The process of bombarding the sample surface with a high-energy ion beam to sputter the sample's atoms off the surface.
......
This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 15 pages — is available in the English PDF.
Referenced standards
Editions of GB/T 45459
| Edition | Title | Revision | Status |
|---|---|---|---|
| GB/T 45459-2025 | Microbeam analysis - Focused ion beam - Preparation of TEM specimens | current edition | Current |
This page sells the current edition, GB/T 45459-2025. Earlier editions are listed for reference only.
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