GB/T 14603-2025Electronic gas — Halide gas (English PDF)

Foreword

This document is in accordance with the provisions of GB/T 1.1-2020 "Guidelines for standardization work Part 1: Structure and drafting rules for standardization documents" Drafting.

This document replaces GB/T 14603-2009 "Gas Boron Trifluoride for Electronics Industry", GB/T 14602-2014 "Gas Boron Trifluoride for Electronics Industry" GB/T 18994-2014 "High-purity chlorine gas for electronic industry", GB/T 17874-2021 "Trichlorinated gas for electronic industry" Boron", GB/T 26251-2010 "Fluorine and fluorine-nitrogen mixed gas", and GB/T 14603-2009, GB/T 14602-2014, Compared with GB/T 18994-2014, GB/T 17874-2021 and GB/T 26251-2010, in addition to structural adjustments and editorial changes, the main changes are.

The technical changes are as follows.

— Changed the scope (see Chapter 1, Chapter 1 of GB/T 14603-2009, Chapter 1 of GB/T 14602-2014, Chapter 1 of GB/T 18994-2014, Chapter 1 of GB/T 17874-2021, and Chapter 1 of GB/T 26251-2010);

— Added "Terms and Definitions" (see Chapter 3);

— Changed the technical requirements for halide gases (see Chapter 4, Chapter 3 of GB/T 14603-2009, GB/T 14602-2014 Chapter 3 of GB/T 18994-2014, Chapter 4 of GB/T 17874-2021, and GB/T 26251-2010 Chapter 3 of);

— Changed the sampling requirements (see Chapter 5, 4.1.2 of GB/T 14603-2009, 4.1.2 of GB/T 14602-2014, GB/T 18994-2014, 4.1.2, GB/T 17874-2021, 4.1.3, GB/T 26251-2010);

— Changed the purity calculation method (see 6.1, 4.2 of GB/T 14603-2009);

— Changed the determination method of oxygen, argon, nitrogen, carbon dioxide and sulfur dioxide content in boron trifluoride (see 6.2, GB/T 14603- 2009 versions 4.3 and 4.6);

— Added the method for determining the content of methane and carbon monoxide in boron trifluoride (see 6.2);

— Changed the method for the determination of silicon tetrafluoride content in boron trifluoride (see 6.3, 4.4 of GB/T 14603-2009);

— Deleted the method for determination of sulfate content in boron trifluoride (see 4.5 of GB/T 14603-2009);

— Added the method for determining the content of hydrogen fluoride in boron trifluoride (see 6.3);

— Changed the determination method of oxygen, argon, nitrogen, methane, acetylene, carbon monoxide and carbon dioxide content in hydrogen chloride (see 6.4, GB/T 14602-2014, 4.3);

— Changed the determination method of hydrogen, oxygen, argon, nitrogen, methane, carbon monoxide and carbon dioxide content in high-purity chlorine (see 6.5, GB/T 18994- 4.3 of 2014);

— Changed the method for determination of metal element content in high-purity chlorine (see 6.17, 4.5 of GB/T 18994-2014);

— Added the method for determining the content of oxygen, argon, nitrogen and carbon tetrafluoride in chlorine trifluoride (see 6.9);

— Added the method for determining the content of hydrogen fluoride in chlorine trifluoride (see 6.10);

— Changed the method for determining the fluorine content in fluorine-nitrogen mixtures (see 6.11, 4.2 of GB/T 26251-2010);

— Changed the method for determining the content of (oxygen and argon) in fluorine and nitrogen mixtures (see 6.12, 4.2 of GB/T 26251-2010);

— Changed the method for determining the content of carbon tetrafluoride and hydrogen fluoride in fluorine-nitrogen mixture (see 6.13, 4.2 of GB/T 26251-2010);

— Added the method for determining the content of sulfur hexafluoride, carbon monoxide, carbon dioxide, carbonyl fluoride and silicon tetrafluoride in fluorine-nitrogen mixed gas (see 6.13);

— Added the determination method of hydrogen, oxygen, argon, nitrogen, methane, carbon monoxide and carbon dioxide content in hydrogen bromide (see 6.14);

— Added the method for determining the content of hydrogen chloride in hydrogen bromide (see 6.15);

— Added the method for determining the water content in hydrogen bromide (see 6.16);

— Added the method for determining the content of metal elements in boron trifluoride (see 6.17);

— Changed the method for determination of metal element content in hydrogen chloride (see 6.17, 4.5 of GB/T 14602-2014);

— Added the method for determining the content of metal elements in chlorine trifluoride (see 6.17);

— Added the method for determining the content of metal elements in hydrogen bromide (see 6.17);

— Increased exhaust gas treatment requirements (see 6.18);

— Changed the inspection rules (see Chapter 7, 4.1 of GB/T 14603-2009, 4.1 of GB/T 14602-2014, GB/T 18994-2014, 4.1; GB/T 26251-2010, 4.1);

— Changed the requirements for marking, packaging, transportation, storage and safety information (see Chapter 8, Chapter 5 of GB/T 14603-2009, Chapter 5 of GB/T 14602-2014, Chapter 5 of GB/T 18994-2014, Chapter 8 of GB/T 17874-2021, Chapter 5 of GB/T 26251-2010).

Please note that some of the contents of this document may involve patents. The issuing organization of this document does not assume the responsibility for identifying patents.

This document was proposed and coordinated by the National Technical Committee for Semiconductor Equipment and Materials Standardization (SAC/TC203).

This document was drafted by: Haohua Gas Co., Ltd. Southwest Branch, Fujian Del Technology Co., Ltd., Shandong Heyi Gas Co., Ltd.

Co., Ltd., Zhejiang Ruiheng Electronic Materials Co., Ltd., Beijing Huayu Tongfang Chemical Technology Development Co., Ltd., Fujian Fudou New Materials Co., Ltd.

Dalian Huabang Chemical Co., Ltd., Zhejiang Zhongning Silicon Industry Co., Ltd., Fujian Yongjing Technology Co., Ltd., Disener (Beijing) Science and Technology Co., Ltd.

Technology Co., Ltd., Shanghai Lizhi Semiconductor Technology Co., Ltd., Tangshan Sanyou Electronic Chemicals Co., Ltd., Zhejiang Yingdesai Semiconductor Materials Co., Ltd.

Materials Co., Ltd., Guangzhou Guanggang Gas Energy Co., Ltd., Tongfang Weishi Technology Co., Ltd., Beijing Jianzhi Technology Co., Ltd.

Ningbo Congyue Technology Innovation Co., Ltd., Tianjin Green Ling Gas Co., Ltd., Fujian Jiuce Gas Co., Ltd., Beijing Purui Gas Co., Ltd.

Analytical Instrument Co., Ltd., Dalian Kelide Semiconductor Materials Co., Ltd., Guangdong Huate Gas Co., Ltd., Nanjing Optoelectronics (Ulanqab Co., Ltd., Fujian Hengshen Electronic Materials Technology Co., Ltd., CSSC (Handan) Perri Specialty Gas Co., Ltd., Zhonghao Guangming Chemical Research and Design Institute Co., Ltd., Dalian Guangming Chemical Industry Gas Quality Monitoring Center Co., Ltd., Air Liquide (China) Investment Co., Ltd., Bruker (Beijing) Technology Co., Ltd., Hangzhou Yunbi Technology Co., Ltd., Shanghai Huaai Chromatography Analysis Technology Co., Ltd., Dalian Date Gas Co., Ltd., Lianxiong Investment (Shanghai) Co., Ltd., Langxi Instrument (Shanghai) Co., Ltd., Hangzhou New Century Mixed Gas Co., Ltd., Shenyang Zhong Fu Ke Jin Pressure Vessel Co., Ltd., China Jiliang University, Beijing Ruixinjie Environmental Protection Technology Co., Ltd., China Metrology and Testing Society, Ireland AGC Instrument Co., Ltd. Beijing Representative Office, Shanghai Fanwei Instrument Equipment Co., Ltd., Guizhou Product Quality Inspection and Testing Institute, Suzhou Yivite New Materials Co., Ltd. and Southwest Chemical Research and Design Institute Co., Ltd.

The main drafters of this document are: Lai Xiaofeng, Chen Shihua, Yang Jun, Li Jianxin, Guo Xiaojun, Ma Jianxiu, Li Jialei, Wang Zhejun, Li Zhi, Sun Fang, Guo Qiong, Hou Peng, Qian Ji, Zhao Bin, Wu Xihu, Liu Chunhua, Li Wen, Li Changjian, Peng Foxiao, Ren Ru, Xu Zhengjun, Zheng Cunqiang, Ni Zhiyuan, Zhao Xiaolan, Dong Xiaoyang, Lu Yanzhu, Chen Zhiqiang, Wang Hongqiu, Huang Tao, Tang Ping, Wu Yuqiang, He Jingyu, Li Jingsheng, Zhao Yinfeng, Shi Yini, Chen Yanshan, Yang Junhao, Wang Xinxi, Liu Guangyu, Lü Lei, Li Tinghui, Zheng Qiuyan, Teng Xinsheng, Sun Funan, Chang Xia, Niu Di, Yin Hao, Wang Ruowen, Zhao Yue, Wang Junfeng, Li Anlin, Fang Hua, Xin Ling, Du Yutong, Huang Hui, Li Jianhao, Wang Xiangke, Zhang Jinbo, Li Ming, Gong Bing, Zhang Pengyue, Zhao Jie, Yang Yangzhongfu, Ren Xihui, He Bo, Tang Zhongwei, Cheng Huapeng, Tan Yiqiang, Yin Lele, Zhou Pengyun, Tang Xiamei.

The previous versions of this document and the documents it replaces are as follows.

— First published in 1993 as GB/T 14603-1993 and first revised in 2009 as GB/T 14603-2009;

— First published in 1993 as GB/T 14602-1993, first revised in 2009 as GB/T 14602-2009, and revised in 2014 as GB/T 14602-2015.

The second revision incorporated the contents of GB/T 24469-2009 "5N Hydrogen Chloride Gas for Electronics Industry";

— First issued as GB/T 18994-2003 in 2003 and first revised as GB/T 18994-2014 in 2014;

— First published in 1999 as GB/T 17874-1999, first revised in 2010 as GB/T 17874-2010, The second revision is GB/T 17874-2021;

— First published in 2010 as GB/T 26251-2010;

— This is the third revision, GB/T 14603-2009, GB/T 14602-2014, GB/T 18994-2014, GB/T 17874-2021 and GB/T 26251-2010 are integrated and revised. Electronic Gases Halide Gases

1 Scope

This document specifies the technical requirements for halide gases, describes the corresponding test methods, and also specifies the sampling, inspection rules, marking, packaging, Packaging, transportation and storage requirements and safety information are provided.

This document applies to halide gases purified from industrial halide gases as raw materials.

2 Normative references

GB 190

GB/T 4844

GB/T 5099

GB/T 5832.3

GB/T 6682

GB/T 7144

GB/T 8979

GB/T 8984

GB/T 11640

GB/T 11736

GB/T 14193

GB 15258

GB/T 16804

GB/T 28726

GB/T 33145

GB/T 34972

GB/T 43306

3 Terms and Definitions

The following terms and definitions apply to this document.