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GB/T 31227-2014Test method for the surface roughness by atomic force microscope for sputtered thin films (English PDF)

原子力显微镜测量溅射薄膜表面粗糙度的方法

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Issued by

SAMR; SAC

Level / Type

National · Recommended

Issue date

September 30, 2014

Implementation date

April 15, 2015

Scope

GB/T 31227-2014 is the English-translated version of 原子力显微镜测量溅射薄膜表面粗糙度的方法.

GB/T 31227-2014 is the Chinese standard "Test method for the surface roughness by atomic force microscope for sputtered thin films". Its scope clause reads: This standard specifies the use of an atomic force microscope (AFM) surface roughness measurement method.

This standard applies to measuring sputtering deposition method to generate an average roughness Ra of the film is less than 100nm. Surface roughness measurement of other non-sputtered film can refer to this method. Its clauses include terms and definitions, symbols and abbreviations.

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Document preview — GB/T 31227-2014

National Standard of the People's Republic of China

ICS: 17.040.20
Classification: J 04

Issued by: State Administration for Market Regulation; Standardization Administration of the PRC

1 Scope
2 Normative references
3 Terms and definitions, symbols and abbreviations
3.1 Terms and Definitions
3.2 Symbols and abbreviations

1 Scope

This standard specifies the use of an atomic force microscope (AFM) surface roughness measurement method.

This standard applies to measuring sputtering deposition method to generate an average roughness Ra of the film is less than 100nm.

Surface roughness measurement of other non-sputtered film can refer to this method.

2 Normative references

The following documents for the application of this document is essential. For dated references, only the dated version suitable for use herein

Member. For undated references, the latest edition (including any amendments) applies to this document.

GB/T 27760-2011 use of Si (111) crystal surface atomic steps on the sub-nanometer atomic force microscope height measurement calibration method.

3 Terms and definitions, symbols and abbreviations

3.1 Terms and Definitions

GB/T 27760-2011 define the following terms and definitions apply to this document.

3.1.1 AFM atomicforcemicroscope

The use of Si (111) crystal surface atomic steps on the sub-nanometer atomic force microscopy method of calibrating the height measurement.

3.1.2 Sputtered film

The use of a uniform film sputtering process in some matrix formation.

3.1.3 Pollution Probe tipcontaminated

Adsorbed on the surface of the probe tip of the other substances, causing contamination of the tip.

3.2 Symbols and abbreviations

The following symbols and abbreviations apply to this document (see Table 1).

Table 1 Symbols and Abbreviations

Abbreviations and symbols Description Unit

AFM Atomic Force Microscope (AtomicForceMicroscope)

Mica Mica for xy direction AFM atomic level resolution correction

Nm average roughness Ra

Rq roughness nm root mean square deviation […]

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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 15 pages — is available in the English PDF.

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