GB/T 1558-2023Test method for substitutional carbon content in silicon by infrared absorption (English PDF)
硅中代位碳含量的红外吸收测试方法
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Issued by
SAMR; SAC
Level / Type
National · Recommended
Issue date
December 28, 2023
Implementation date
July 1, 2024
Scope
GB/T 1558-2023 is the English-translated version of 硅中代位碳含量的红外吸收测试方法.
GB/T 1558-2023 describes the infrared absorption test method for the substitutional carbon content of silicon.
It applies to p-type silicon single-crystal wafers with a resistivity above 3 ohm·cm and to n-type wafers with a resistivity above 1 ohm·cm, and it states the test range both at room temperature and below 80 K. The document sets out the method principle, the interference factors, the test conditions, the instruments and equipment, the sample, the test procedure, the precision and the test report, and it adds an Annex A. It defines background spectrum, baseline, baseline absorbance, reference spectrum and sample spectrum, and cites GB/T 8170, GB/T 8322, GB/T 14264, GB/T 29057 and GB/T 35306.
It replaces GB/T 1558-2009, was issued on 28 December 2023 and has applied since 1 July 2024.
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Document preview — GB/T 1558-2023
National Standard of the People's Republic of China
- ICS
- 77.040
- Classification
- H 17
- Replacing
- GB/T 1558-2009
Issued by: State Administration for Market Regulation; Standardization Administration of the PRC
Contents
- Foreword
- 1 Scope
- 2 Normative reference documents
- 3 Terms and definitions
Foreword
This document complies with the provisions of GB/T 1.1-2020 "Standardization Work Guidelines Part 1: Structure and Drafting Rules of Standardization Documents" drafting.
This document replaces GB/T 1558-2009 "Infrared absorption measurement method for substituted carbon atom content in silicon". Compared with GB/T 1558-2009, in addition to structural adjustments and editorial changes, the main technical changes are as follows:
a) Changed the scope (see Chapter 1, Chapter 1 of the 2009 edition);
b) Changes in terms and definitions (see Chapter 3, Chapter 3 of the 2009 edition);
c) The method principle has been changed (see Chapter 4, Chapter 4 of the 2009 edition);
d) The content of interference factors has been changed (see 5.2, 5.3, 5.4, 5.6, 5.2, 5.3, 5.4, 5.6 of the 2009 version), and the content of interference factors has been added: capacity (see 5.8, 5.9, 5.10, 5.11, 5.12, 5.13);
e) Added test conditions (see Chapter 6);
f) The requirements for instruments and equipment have been changed (see 7.2, 6.2 of the 2009 version), and the requirements for "window materials" and "thermometers" have been deleted (see 2009 version, 6.4, 6.5);
g) The sample has been changed (see Chapter 8, Chapter 7 of the 2009 edition);
h) The test procedures have been changed (see Chapter 9, Chapter 8 of the 2009 edition);
i) Changed the precision (see Chapter 11, Chapter 10 of the 2009 edition);
j) The test report has been changed (see Chapter 12, Chapter 11 of the 2009 edition);
k) Added Appendix A (see Appendix A).
1 Scope
This document describes the infrared absorption test method for the content of substituted carbon atoms in silicon.
This document is applicable to p-type silicon single-crystal wafers with a resistivity greater than 3 ohm·cm and n-type silicon single-crystal wafers with a resistivity greater than 1 ohm·cm: test of carbon atom content (test range at room temperature: 5 x 10^15cm-3 to the maximum solid solubility of carbon atoms in silicon; measured when the temperature is lower than 80K, test range: not less than 5 x 10^14cm-3).
2 Normative reference documents
The contents of the following documents constitute essential provisions of this document through normative references in the text. Among them, the dated quotations For undated referenced documents, only the version corresponding to that date applies to this document; for undated referenced documents, the latest version (including all amendments) applies to this document.
GB/T 8170 Numerical rounding rules and expression and determination of limit values
GB/T 8322 Molecular absorption spectrometry terminology
GB/T 14264 Semiconductor material terminology
GB/T 29057 Procedure for evaluating polycrystalline silicon rods using zone melting crystal pulling method and spectral analysis method
GB/T 35306 Determination of carbon and oxygen content in silicon single crystals by low-temperature Fourier transform infrared spectroscopy
3 Terms and definitions
The terms and definitions defined in GB/T 14264 and GB/T 8322 and the following apply to this document.
3.1 Background spectrum
In an infrared spectrometer, a single beam is used to measure the spectral lines obtained without the presence of a sample.
Note: Usually includes nitrogen, air and other information.
3.2 Baseline
Tangents taken from the minimum absorbance points on either side of the carbon peak in the test spectrum.
3.3 Baseline absorbance
The baseline value at the wavenumber corresponding to the carbon peak from which the absorption peak height is calculated.
3.4 Reference spectrum
Spectrum of the reference sample.
Note: When testing with a double-beam spectrometer, place the reference sample in the sample optical path and obtain the result when the reference optical path is empty; when testing with a Fourier transform infrared spectrometer and a single When using a beam spectrometer, the spectrum is obtained by subtracting the background spectrum from the spectrum of the reference sample.
3.5 Sample spectrum
Spectrum of the test sample.
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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 15 pages — is available in the English PDF.
Referenced standards
Normative references
- GB/T 8170Rules of rounding off for numerical values & expression and judgement of limiting values
- GB/T 8322Molecular absorption spectrometry -- Terminology
- GB/T 14264Terminology of semiconductor materials
- GB/T 29057Practice for evaluation of polocrystalline silicon rods by float-zone crystal growth and spectroscopy
- GB/T 35306Determination of carbon and oxygen content in single crystal silicon—Low temperature fourier transform infrared spectrometry method
Cited by
- GB/T 29057-2023Practice for evaluation of polocrystalline silicon rods by float-zone crystal growth and spectroscopy
- GB/T 12963-2022Electronic-grade polycrystalline silicon
- GB/T 41652-2022Silicon electrode and silicon ring for plasma etching machine
- GB/T 25076-2018Monocrystalline silicon for solar cell
- GB/T 25074-2017Solar-grade polycrystalline silicon
- GB/T 12962-2015Monocrystalline silicon
Similar standards
Editions of GB/T 1558
| Edition | Title | Revision | Status |
|---|---|---|---|
| GB/T 1558-2023 | Test method for substitutional carbon content in silicon by infrared absorption | current edition | Current |
| GB/T 1558-2009 | Test method for substitutional carbon content in silicon by infrared absorption | previous edition | Superseded |
This page sells the current edition, GB/T 1558-2023. Earlier editions are listed for reference only.
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Related Standards
GB/T 14264-2024 — Terminology of semiconductor materials
GB/T 29057-2023 — Practice for evaluation of polocrystalline silicon rods by float-zone crystal growth and spectroscopy
GB/T 35306-2023 — Determination of carbon and oxygen content in single crystal silicon—Low temperature fourier transform infrared spectrometry method
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