GB/T 26032-2010Evaporated nickel material (English PDF)

Foreword

GB/T 26032-2010 was issued on 10 January 2011 by the General Administration of Quality Supervision, Inspection and Quarantine and the Standardization Administration of the People's Republic of China, and has been in force since 1 October 2011.

The document is a recommended national standard: the /T in the designation marks it as recommended rather than compulsory.

1 Scope

China's national standard for evaporated nickel material - the high-purity nickel charge that is vaporised in a vacuum chamber to lay down a thin nickel film on a semiconductor wafer. Everything about this product is governed by one fact: whatever is in the charge ends up in the film. A thin film is a few hundred atoms thick, so an impurity present at a few parts per million in the source becomes a significant fraction of what is deposited, and the alkali metals in particular - sodium, potassium, lithium - are mobile in silicon dioxide and will drift under bias into the gate of a transistor and shift its threshold voltage over the life of the device. That is why this standard's purity requirements are stated in parts per million and go down to hundredths of a part per million for the alkalis, and why the non-metallic elements are controlled separately: carbon, hydrogen, nitrogen, oxygen and sulfur dissolved in the metal cause spitting and pinholes as the charge is evaporated. The standard specifies the requirements, test methods, inspection rules, marking, packaging, transport, storage, quality certificate and contents of the order or contract for evaporated nickel material, classifying it into two purity grades and two shapes, sheet and rod. It applies to the various kinds of evaporated nickel material used in the semiconductor industry, and material for other uses may also refer to it.

This standard specifies the requirements, test methods, inspection rules, marking, packaging, transport, storage, quality certificate and the contents of the order form or contract for evaporated nickel material.

This standard applies to the various kinds of evaporated nickel material used in the semiconductor industry. Evaporated nickel material for other uses may also be dealt with by reference to this standard.

2 Normative references

The following documents are indispensable for the application of this document. For dated references, only the edition cited applies. For undated references, the latest edition of the referenced document, including all amendments, applies.

GB/T 2828.1 Sampling procedures for inspection by attributes - Part 1: Sampling schemes indexed by acceptance quality limit (AQL) for lot-by-lot inspection.

GB/T 8647.8 and GB/T 8647.9 Methods for chemical analysis of nickel - Determination of sulfur content and of carbon content by high frequency induction furnace combustion infrared absorption.

GB/T 15077 Test methods for geometrical dimensions of precious metals and their alloys.

GB/T 26016-2010 High purity nickel.