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GB/T 31958-2023Substrate glass for amorphous silicon thin film transistor liquid crystal display device (English PDF)

非晶硅薄膜晶体管液晶显示器用基板玻璃

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Issued by

SAMR; SAC

Level / Type

National · Recommended

Issue date

August 6, 2023

Implementation date

March 1, 2024

Scope

GB/T 31958-2023 is the English-translated version of 非晶硅薄膜晶体管液晶显示器用基板玻璃.

GB/T 31958-2023 is the Chinese national standard for the substrate glass of amorphous silicon thin film transistor liquid crystal displays.

It gives the requirements - the dimensions and their tolerances, thickness and its variation, warp, surface quality and defects, the thermal, optical and chemical properties that the panel process demands - the test methods, the inspection rules and the provisions on packaging, marking, transport and storage.

It applies to the design, production, development and testing of this substrate glass. Glass makers and panel plants use it. It replaces GB/T 31958-2015, was issued on 6 August 2023 and has applied since 1 March 2024.

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Document preview — GB/T 31958-2023

National Standard of the People's Republic of China

ICS
81.040.30
Classification
Q 34
Replacing
GB/T 31958-2015

Issued by: State Administration for Market Regulation; Standardization Administration of the PRC

Contents

  • Foreword
  • 1 Scope
  • 2 Normative reference documents
  • 3 Terms and definitions

Foreword

This document complies with the provisions of GB/T 1.1-2020 "Standardization Work Guidelines Part 1: Structure and Drafting Rules of Standardization Documents" Drafting.

This document replaces GB/T 31958-2015 "Substrate Glass for Thin Film Transistor Liquid Crystal Displays" and is consistent with GB/T 31958-2015 In addition to structural adjustments and editorial changes, the main technical changes are as follows.

a) The terms and definitions of point defects, surface contamination, scratches, falling pieces, missing corners, and effective areas have been deleted (see 3.1~3.5 of the.2015 edition, 3.11), the definitions of positioning angle and right angle have been changed (see 3.4, 3.6, 3.12 and 3.14 of the.2015 version);

b) Changed the requirements for appearance quality (see 4.1, 4.1 of the.2015 version);

c) Changed the requirements for length deviation and width deviation (see 4.2.1,.2015 version of 4.2.1);

d) Changed the requirements for thickness difference (see 4.2.3, 4.2.2 of the.2015 version);

e) Changed the requirements for cutting angle deviation and positioning angle deviation (see 4.2.4, 4.2.3 of the.2015 edition);

f) The requirements for waviness and warpage have been changed (see 4.3 and 4.5, 4.3 and 4.4 of the.2015 edition);

g) Added surface roughness requirements (see 4.4);

h) Added thermal conductivity, softening point, annealing point, reheat line shrinkage, stress, elastic modulus, volume resistivity, dielectric constant, dielectric Loss performance requirements (see 4.6);

i) Changed the performance indicators of average linear thermal expansion coefficient, density, and strain point (see 4.6, 4.5~4.7 of the.2015 version);

j) Changed the performance indicators of chemical durability (see 4.6, 4.9 of the.2015 version);

k) The test method for appearance quality has been changed (see 5.2,.2015 version of 5.2);

l) Changed the thickness measurement diagram (see 5.3.2, 5.3.2 of the.2015 version);

m) Changed the positioning angle and cut angle measurement diagram (see 5.3.3,.2015 version of 5.3.3);

n) Changed the test method and measurement diagram of right angle (see 5.3.4,.2015 version of 5.3.4);

o) The test method for waviness has been changed (see 5.4,.2015 version of 5.4);

p) Increased surface roughness, thermal conductivity, softening point, annealing point, reheat line shrinkage, stress, elastic modulus, volume resistivity, dielectric Test methods for electrical constant and dielectric loss (see 5.5, 5.7, 5.9, 5.10, 5.12, 5.14, 5.15, 5.17~5.19);

q) The test method for warpage has been changed (see 5.6, 5.5 of the.2015 edition);

r) The test method for the average linear thermal expansion coefficient has been changed (see 5.8, 5.6 of the.2015 edition);

s) The test method for strain point has been changed (see 5.11, 5.8 of the.2015 edition);

t) The test method for density has been changed (see 5.13, 5.7 of the.2015 edition);

u) The test method for transmittance has been changed (see 5.16, 5.9 of the.2015 edition);

v) Changed the test method for chemical durability (see 5.20, 5.10 of the.2015 version);

w) The test method for alkali metal oxide content has been changed (see 5.21, 5.11 of the.2015 edition);

x) Added individual judgment content, including items listed in surface roughness and physical and chemical properties (see 6.3.4.1);

y) Changes in transportation and storage requirements (see 7.3 and 7.4,.2015 version of 7.3 and 7.4).

1 Scope

This document specifies the requirements for substrate glass for amorphous silicon thin film transistor liquid crystal displays, test methods, inspection rules, packaging, marking, Transportation and storage.

This document applies to the design, production, and research and development of substrate glass for amorphous silicon thin film transistor liquid crystal displays (hereinafter referred to as "substrate glass") and testing.

2 Normative reference documents

The contents of the following documents constitute essential provisions of this document through normative references in the text. Among them, the dated quotations For undated referenced documents, only the version corresponding to that date applies to this document; for undated referenced documents, the latest version (including all amendments) applies to this document.

GB/T 1409 Measurement of permittivity and dielectric loss factor of electrical insulating materials at power frequency, audio frequency, and high frequency (including meter wave wavelength) Recommended method

GB/T 1549 Chemical analysis methods for fiber glass GB T2680-2021 Architectural glass visible light transmittance, direct sunlight transmittance, total solar energy transmittance, ultraviolet transmission Compared with the determination of relevant window glass parameters

GB/T 2828.1-2012 Enumeration sampling inspection procedures Part 1: Batch-by-batch inspection sampling retrieved by acceptance quality limit (AQL) plan

GB/T 5432 Glass density determination buoyancy method

GB/T 5700-2008 Lighting measurement methods

GB/T 16920 Determination of average linear thermal expansion coefficient of glass

GB/T 28195 Glass softening point test method

GB/T 31838.7-2021 Dielectric and resistive properties of solid insulating materials Part 7: Resistive properties (DC method) High temperature Measure volume resistance and volume resistivity

GB/T 32639 Flat panel display substrate glass terminology

GB/T 32642 Measurement method for surface roughness of flat panel display substrate glass

GB/T 32643 Measurement method for surface waviness of flat panel display substrate glass

GB/T 32644-2016 Test method for chemical durability of flat panel display substrate glass

GB/T 37780 Test methods for elastic modulus, shear modulus and Poisson's ratio of glass materials

GB/T 38711 Test method for reheat shrinkage of ultra-thin glass Laser method

GB/T 38712 Test method for thermal conductivity of ultra-thin glass - Heat flow method

SJ/T 11039 Test method for annealing point and strain point of electronic glass

3 Terms and definitions

The terms and definitions defined in GB/T 32639, GB/T 38711 and the following apply to this document.

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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 21 pages — is available in the English PDF.

Referenced standards

Normative references

SJ/T 11039

Similar standards

Editions of GB/T 31958

EditionTitleRevisionStatus
GB/T 31958-2023Substrate glass for amorphous silicon thin film transistor liquid crystal display devicecurrent editionCurrent
GB/T 31958-2015Substrate glass for amorphous silicon thin film transistor liquid crystal display deviceprevious editionSuperseded

This page sells the current edition, GB/T 31958-2023. Earlier editions are listed for reference only.

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