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GB/T 45826-2025Titania doped silica glass for lithography (English PDF)

光刻用掺钛石英玻璃

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Issued by

SAMR; SAC

Level / Type

National · Recommended

Issue date

May 30, 2025

Implementation date

December 1, 2025

Scope

GB/T 45826-2025 is the English-translated version of 光刻用掺钛石英玻璃.

GB/T 45826-2025 is the Chinese national standard covering the glass used for the reflective optics of a lithography machine — the titanium dioxide doping that holds the average linear expansion coefficient to no more than five parts in a hundred million per degree, which is what keeps the mirror figure stable as it heats under exposure, the dimensions and the key and non-key areas, the bubbles, gas lines and striae, the stress birefringence, and the inspection and packaging. First edition, under the China Building Materials Federation. In force from 1 December 2025. Issued on 30 May 2025, it has been in force since 1 December 2025.

Document preview — GB/T 45826-2025

National Standard of the People's Republic of China

ICS: 81.040.30
Classification: Q 35

Issued by: State Administration for Market Regulation; Standardization Administration of the PRC

Foreword
1 Scope
2 Normative references
3 Terms and definitions
3.1
4 Requirements
4.1 Specifications and dimensions

Foreword

This document is in accordance with the provisions of GB/T 1.1-2020 "Guidelines for standardization work Part 1: Structure and drafting rules for standardization documents" Drafting.

Please note that some of the contents of this document may involve patents. The issuing organization of this document does not assume the responsibility for identifying patents.

This document was proposed by China Building Materials Federation.

This document is under the jurisdiction of the National Technical Committee for Standardization of Industrial Glass and Special Glass (SAC/TC447).

This document was drafted by: Hubei Feilihua Quartz Glass Co., Ltd., China Building Materials Science Research Institute Co., Ltd., China China Testing Holding Group Co., Ltd., Glass New Materials Innovation Center (Anhui) Co., Ltd., Institute of Microelectronics, Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, China National Building Material Group Co., Ltd., Chengdu Guangming Optoelectronics Co., Ltd.

Co., Ltd., Chengdu Guangming Optoelectronics Co., Ltd., Weihai Changhe Optical Technology Co., Ltd., Nantong Crystal Co., Ltd., China Metrology Science and Technology Co., Ltd.

Institute of Optoelectronics, Chinese Academy of Sciences, Jiuzhi Optoelectronic Materials Technology Co., Ltd., Shanghai Optical Precision Mechanics, Chinese Academy of Sciences Institute, Jinan Guangwei Semiconductor Technology Co., Ltd., Shanghai Feilihua Shichuang Technology Co., Ltd., Shenguang Optical Group Co., Ltd., Shanghai Chuan Xin Semiconductor Co., Ltd., Chengdu Luwei Optoelectronics Co., Ltd., Changsha Shaoguang Core Materials Technology Co., Ltd., and Chongqing Testing of China Testing Holding Group Ltd.

The main drafters of this document are: Zhang Han, Nie Lanjian, Liu Junlong, Xia Guojun, Xie Changqing, Zhang Haitao, Shen Yichun, Qian Yigang, Shao Zhufeng, Wang Hui, Liu Huanmin, Liu Yaru, Wang Jingxia, Li Peiyue, Yu Hao, Chen Weidong, Liu Zhenyu, Mao Lulu, Yun Shidong, Mo Dahong, Wang Shikai, Pei Guangqing, Cao Xin, Cui Jianqiu, Huang Ting, Qin Weiguang, Han Fu, Jin Xiaorong, Huang Yun, Lu Weimin, Cai Xiaofeng, Si Jiwei, Zheng Yuchen, Li Yizhou, Wang Liangliang, Hu Huirong.

Titanium-doped quartz glass for photolithography

1 Scope

This document specifies the requirements, inspection rules, and marking, packaging, and transportation of titanium-doped quartz glass for lithography (hereinafter referred to as titanium-doped quartz glass).

Transport and storage, and the corresponding test methods are described.

This document applies to the production, inspection, delivery and acceptance of titanium-doped quartz glass used in semiconductor integrated circuit lithography reflective optical systems.

2 Normative references

GB/T 191

GB/T 5949

GB/T 7962.7

GB/T 43881

3 Terms and definitions

The terms and definitions defined in JC/T 2205 and the following apply to this document.

3.1

Quartz glass containing titanium dioxide whose average linear thermal expansion coefficient is not greater than 5x10-8 °C-1 within a certain temperature range.

Note. The minimum test temperature of the average linear thermal expansion coefficient shall not be lower than -50°C and the maximum test temperature shall not exceed 300°C.

4 Requirements

4.1 Specifications and dimensions

The diameter (or length and width) and its deviation, thickness and its deviation, key area and non-key area of titanium-doped quartz glass shall be agreed upon by the supply and demand parties.

The schematic diagram of key areas and non-key areas is shown in Figure 1.

......
This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 15 pages — is available in the English PDF.

Referenced standards

Normative references

Editions of GB/T 45826

Edition	Title	Revision	Status
GB/T 45826-2025	Titania doped silica glass for lithography	current edition	Current

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