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GB/T 38518-2020Measurement of coating thickness on flexible film substrate (English PDF)

柔性薄膜基体上涂层厚度的测量方法

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Issued by

SAMR; SAC

Level / Type

National · Recommended

Issue date

March 6, 2020

Implementation date

February 1, 2021

Scope

GB/T 38518-2020 is the English-translated version of 柔性薄膜基体上涂层厚度的测量方法.

GB/T 38518-2020 is the Chinese standard "Measurement of coating thickness on flexible film substrate".

Its scope clause reads: This Standard specifies the basic methods and principles of scanning electron microscope measurement of coating thickness (including organic, inorganic and metal coatings) on flexible film substrate, standard samples and equipment, operating methods, and data processing methods.

This Standard applies to the measurement of coating whose thickness is 10 nm ~ 0.5 mm on flexible film substrate whose thickness is not more than 3 mm. Its clauses include basic methods and principles; standard samples and equipment; operating methods; data processing.

It was issued by the State Administration for Market Regulation on MARCH 06, 2020 and took effect on FEBRUARY 01, 2021.

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Document preview — GB/T 38518-2020

National Standard of the People's Republic of China

ICS
25.220.01
Classification
A 29

Issued by: State Administration for Market Regulation; Standardization Administration of the PRC

Contents

  • Foreword3
  • 1 Scope4
  • 2 Normative references4
  • 3 Basic methods and principles4
  • 4 Standard samples and equipment5
  • 5 Operating methods5
  • 6 Data processing9

1 Scope

This Standard specifies the basic methods and principles of scanning electron microscope measurement of coating thickness (including organic, inorganic and metal coatings) on flexible film substrate, standard samples and equipment, operating methods, and data processing methods.

This Standard applies to the measurement of coating whose thickness is 10 nm ~ 0.5 mm on flexible film substrate whose thickness is not more than 3 mm.

2 Normative references

The following documents are indispensable for the application of this document.

For dated references, only the dated version applies to this document. For undated references, the latest edition (including all amendments) applies to this document.

GB/T 20307-2006, General rules for nanometer-scale length measurement by SEM

3 Basic methods and principles

3.1 Section preparation

In view of problems like distortion or abrasive particle embedding that are caused by mechanical polishing of flexible film substrate, the use of an argon ion beam polishing machine can effectively polish the cross-section of the flexible film substrate. Under the secondary electron image or backscattered electron image of the scanning electron microscope, it can clearly distinguish between the flexible film substrate and the coating on the substrate.

The argon ion beam polishing machine is mainly composed of a sample chamber with a turbo vacuum pump and an optical microscope for sample positioning. During the polishing process, fix the sample on the sample holder; select the sample polishing area under the optical microscope; then, use a shielding plate to cover the non-target area of the sample and expose only the area that needs to be polished; after vacuuming, the argon gas passes through the ion source to generate an ion beam, which bombards the sample polishing area after accelerating and concentration clustering, and collides with the

f) If there is no standard sample of appropriate graduation value, extend the standard sample in accordance with B.2 of GB/T 20307-2006.

5 Operating methods

5.1.2 In the mold, lay the to-be-tested sample flat; pour into a uniformly equipped cold mounting resin according to the proportion for mounting.

5.1.3 Perform rough grinding and fine grinding on the upper surface and cross section of the mounted sample that is obtained in 5.1.2, so that the roughness Ra is not greater than 20 µm, and the distance between the upper surface of the mounted sample and the surface of the to-be-tested sample is less than 0.5 mm, and the cross section of the coating is completely exposed, and the upper surface of the mounted sample is perpendicular to the cross section.

5.1.4 Use hot wax or tape to glue the ground sample to the cuboid sample holder. The section shall be parallel to the edge of the sample holder and 1 mm ~ 2 mm higher than the edge of the sample holder.

5.1.5 Check the argon ion beam polishing machine, to ensure that the center of the focused beam spot of the ion beam coincides with the crosshairs of the optical microscope.

5.1.6 Adjust the tilt angle of the sample stage of the argon ion beam polishing machine to zero.

5.1.7 Place the sample holder in the argon ion beam polishing machine; under the optical microscope, determine the to-be-polished position according to the following principles.

a) Ensure that there is no gap between the baffle and the upper surface of the mounted sample under the 40x optical microscope;

b) Adjust the position of the mounted sample, so that the polished area is in the center of the optical microscope field;

c) Adjust the position of the baffle, to ensure that the edge of the baffle remains parallel to the X axis of the optical microscope scale; make the polished surface of the mounted sample protrude from the lower edge of the baffle by about 50 µm.

5.1.8 Set the working parameters of the argon ion beam polishing machine as follows.

a) The acceleration voltage is 3 kV ~ 6 kV;

b) Current. 170 µA ~ 280 µA;

c) The swing speed of the sample table reaches the fastest speed;

d) Control the argon pressure at 0.03 MPa ~ 0.05 MPa, and the argon flow rate at 1.5 cm³/min ~ 1.8 cm³/min;

5.4 Installation of to-be-tested samples and standard samples

Simultaneously fix the standard sample and the to-be-tested sample on one side or both sides of the cuboid sample holder of the scanning electron microscope, so that the length direction of the standard sample is parallel to the thickness direction of the to-be-tested coating.

5.5 Obtain

the secondary electron image or backscattered electron image of the standard sample and the to-be-tested sample

5.5.1 Adjust the scanning electron microscope to the best working condition. The general requirements are.

a) Select an appropriate working distance;

b) Select an appropriate acceleration voltage;

c) Select an appropriate electron beam current;

d) Select appropriate image contrast and brightness, to make the length mark sharp;

e) Eliminate astigmatism of the electron beam as much as possible;

f) Make the image in focus.

5.5.2 Adjust the tilt angle of the sample stage of the scanning electron microscope to zero.

5.5.3 Select the appropriate magnification. in the to-be-tested magnified image on the display, the coating on the to-be-tested flexible film substrate does not exceed four-fifths of the field; the coating thickness shall be as large as possible.

5.5.4 Move the sample stage, so that the graduated image of the standard sample is in the center of the field; obtain the graduated image of the standard sample; record the actual working distance.

5.5.5 Adjust the height of the to-be-tested sample to the actual working distance of the same testing time as the standard sample. Without changing the state and other parameters of the scanning electron microscope, move the sample stage, so that the thickness direction of the to-be-tested coating in the field is consistent with the gradation direction of the standard sample, and it is in the center of the field, to obtain the image of the to-be-tested coating. […]

5.6 Measurement of enlarged image

......
This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 15 pages — is available in the English PDF.

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