GB/T 33826-2017Measurement of nanofilm thickness on glass substrate—Profilometric method (English PDF)
玻璃衬底上纳米薄膜厚度测量 触针式轮廓仪法
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Issued by
SAMR; SAC
Level / Type
National · Recommended
Issue date
May 31, 2017
Implementation date
December 1, 2017
Scope
GB/T 33826-2017 is the English-translated version of 玻璃衬底上纳米薄膜厚度测量 触针式轮廓仪法.
GB/T 33826-2017 is the Chinese national test method for measuring the thickness of a nanometre film on a glass substrate with a stylus profilometer. It covers the principle, the requirements for the instrument, the test environment, the measurement requirements, the steps and the test report.
It applies to film thicknesses from 10 nm to 1 000 nm where a step exists between film and substrate or can be produced by etching, and other hard flat substrates may also be measured by it.
A step is formed with a mask or by chemical etching, the stylus is then drawn across the surface while the profile data are collected, and the step height gives the film thickness.
It cites GB/T 29505. It was issued on 31 May 2017 and has applied since 1 December 2017.
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Document preview — GB/T 33826-2017
National Standard of the People's Republic of China
- ICS
- 71.040.99
- Classification
- Q 34
Issued by: State Administration for Market Regulation; Standardization Administration of the PRC
Contents
- Foreword
- 1 Scope
- 2 Normative reference documents
- 3 Terms and definitions
- 4 Principle
Foreword
This standard is drafted in accordance with the rules given in GB/T 1.1-2009.
1 Scope
This standard specifies the principle of measuring the thickness of nanometer film on glass substrate with stylus profile method, the requirements of the instrument, the test environment, the requirements, Steps and test reports.
This standard applies to the glass substrate thickness of 10nm ~ 1000nm in the range of nano-film thickness measurement, and the film with the substrate Exist or can be etched out of the steps. Other hard planar substrates can be specified in this standard.
2 Normative reference documents
The following documents are indispensable for the application of this document. For dated references, only the dated edition applies to this document. For undated references, the latest edition (including all modifications) applies to this document.
GB/T 29505 Surface roughness measurement method for silicon flat surface
3 Terms and definitions
The following terms and definitions apply to this document.
3.1 Mask
A masking template that selectively blocks irradiation or material penetration.
3.2 Chemical etching
The use of surface materials in a specific medium or specific environment and the chemical solution of corrosion and removal of the technology.
4 Principle
A step is formed between the surface of the film and the surface of the glass substrate by means of a mask or chemical etching, as shown in Fig.
The stylus of the stylus profile is moved from A to B (or from B to A) along the measured surface, while the surface profile data is collected, The height of the step is calculated so that the film thickness is obtained.
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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 15 pages — is available in the English PDF.
Referenced standards
Normative references
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