GB/T 33763-2017Test method for dislocation density of sapphire single crystal (English PDF)
蓝宝石单晶位错密度测量方法
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Issued by
SAMR; SAC
Level / Type
National · Recommended
Issue date
May 31, 2017
Implementation date
December 1, 2017
Scope
GB/T 33763-2017 is the English-translated version of 蓝宝石单晶位错密度测量方法.
GB/T 33763-2017 measures the dislocation density of sapphire single crystal.
The crystal surface is etched with a chemical etchant that attacks the outcrop of each dislocation line faster than the surrounding material, so that etch pits of a characteristic shape appear, and the dislocation density is obtained by counting the pits per unit area under a metallographic microscope at 50 to 500 times magnification.
The standard gives the formula, the chemical reagents - potassium hydroxide, sodium hydroxide, silica and dilute hydrochloric acid, with their densities and analytical grade - and the equipment.
It applies to polished sapphire single crystal with a dislocation density from 0/cm2 to 100 000/cm2, on the {0001}, {1120}, {1012} and {1010} faces, and it cites GB/T 14264. Issued on 31 May 2017, it has applied since 1 December 2017.
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Document preview — GB/T 33763-2017
National Standard of the People's Republic of China
- ICS
- 77.040
- Classification
- H 25
Issued by: State Administration for Market Regulation; Standardization Administration of the PRC
Contents
- Foreword
- 1 Scope
- 2 Normative reference documents
- 3 Terms and definitions GB/T 14264 The
- 4 Method summary
- 5 Chemical reagents
- 6 Equipment
Foreword
This standard is drafted in accordance with the rules given in GB/T 1.1-2009.
1 Scope
This standard specifies the sapphire single crystal dislocation density measurement method.
This standard is applicable to the measurement of the dislocation density of sapphire single crystal with the dislocation density of 0/cm2 ~ 100000/cm2 after polishing, The detection faces are {0001}, {1120}, {1012}, {1010} faces.
2 Normative reference documents
The following documents are indispensable for the application of this document. For dated references, only the dated edition applies to this document. For undated references, the latest edition (including all modifications) applies to this document.
GB/T 14264 terminology for semiconductor materials
3 Terms and definitions
The terms and definitions defined in GB/T 14264 apply to this document.
4 Method summary
The method uses the preferred chemical etching technique to show dislocation. When corroding the crystal surface with some chemical etchant, on the crystal surface Dislocation line outcrop, the corrosion rate is faster, and thus easily formed by some low index surface with angular corners with a specific shape of the corrosion pits. can The dislocation density Nd is identified by the number of corrosion pits per unit area, calculated according to formula (1).
Where: Nd - dislocation density, in units of per square centimeter (per/cm2); n - the number of dislocation lines passing through the field area S, in units of; S - field of view, in square centimeters (cm2).
5 Chemical reagents
5.1 Potassium hydroxide (rho ~ 2.04 g/cm³), analytical grade.
5.2 Sodium hydroxide (rho ~ 2.13 g/cm³), analytical grade.
5.3 Silica (rho ~ 2.2 g/cm³), analytical grade.
5.4 Dilute hydrochloric acid, rho ~ 1.047 g/mL.
6 Equipment
6.1 metallographic microscope. magnification 50 times to 500 times.
......
This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 15 pages — is available in the English PDF.
Referenced standards
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