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GB/T 30867-2014Test method for measuring thickness and total thickness variation of monocrystalline silicon carbide wafers (English PDF)

碳化硅单晶片厚度和总厚度变化测试方法

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Issued by

Standardization Administration of China

Level / Type

National · Recommended

Issue date

July 24, 2014

Implementation date

February 1, 2015

Scope

GB/T 30867-2014 is the English-translated version of 碳化硅单晶片厚度和总厚度变化测试方法.

GB/T 30867-2014 — This standard specifies the silicon carbide single wafer thickness and total thickness variation (TTV) of test methods, including contact and non-contact two the way.

This standard applies to a diameter of not less than 30mm, a thickness of 0.13mm ~ 1mm SiC single wafer.

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Document preview — GB/T 30867-2014

National Standard of the People's Republic of China

ICS: 29.045
Classification: H 83

Issued by: Standardization Administration of China

What this standard covers1
Document data2
Standards quoted by this document3

What this standard covers

This standard specifies the silicon carbide single wafer thickness and total thickness variation (TTV) of test methods, including contact and non-contact two ways. This standard applies to a diameter of not less than 30 mm, a thickness of 0.13 mm ~ 1 mm S

Document data

International classification (ICS): 29.045.

Chinese classification (CCS): H83.

Estimated length of the Chinese original: 7,787 words.

Standards quoted by this document

GB/T 14264; GB/T 25915.1-2010

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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 5 pages — is available in the English PDF.

Referenced standards

Normative references

Cited by

GB/T 30656-2023Polished monocrystalline silicon carbide wafers

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