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GB/T 27760-2011Test method for calibrating the z-magnification of an atomic force microscope at sub-nanometer displacement levels using si (111) monatomic steps (English PDF)

利用Si(111)晶面原子台阶对原子力显微镜亚纳米高度测量进行校准的方法

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Issued by

Standardization Administration of China

Level / Type

National · Recommended

Issue date

December 30, 2011

Implementation date

May 1, 2012

Scope

GB/T 27760-2011 is the English-translated version of 利用Si(111)晶面原子台阶对原子力显微镜亚纳米高度测量进行校准的方法.

GB/T 27760-2011 — This standard specifies the microscope z-direction scale measurement methods utilizing Si (111) crystal plane atomic step height calibration sample atomic force.

This standard applies to work under atmospheric or vacuum atomic force microscope, and the z-direction magnification ratio reaches maximum magnitude, ie z Displacement in the nanometer and sub-nanometer range, which is an atomic force microscope is used to detect the surface of a semiconductor, optics and other high-tech surface element Surface frequently used detection range.

This standard does not point out all possible security issues before the application of this standard, the user's responsibility to take appropriate safety and health measures Facilities, and to ensure compliance with the conditions relevant national regulations.

NOTE. The standard values \u200b\u200bto international units specified as a standard value, insert values \u200b\u200bin parentheses are for reference only.

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Document preview — GB/T 27760-2011

National Standard of the People's Republic of China

ICS: 19.020
Classification: N 04

Issued by: Standardization Administration of China

What this standard covers1
Document data2
Standards quoted by this document3

What this standard covers

This standard specifies the use of Si (111) crystal surface atomic step height z atomic force microscope sample calibration to standard measurement method. This standard applies to work under atmospheric or vacuum atomic force microscope, and the z order to achieve maximum magnification, ie z displacement in the nanometer and sub-nanometer range, which is the atomic force microscope is used to detect the semiconductor surface, optical devices surfaces and other high-tech component surface frequently used detection range. This standard does not indicate that all possible security problems in the application of this standard, the user has the responsibility to take appropriate safety and health practices and to ensure compliance with the relevant regulations of the condition.

Document data

International classification (ICS): 19.020.

Chinese classification (CCS): N04.

Estimated length of the Chinese original: 14,185 words.

Adopted international standard: ASTM E2530-2006, MOD.

Standards quoted by this document

ISO 25178-6-2010; ISO/IEC GUIED 98-3-2008; ISO/TS 21748-2004

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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 9 pages — is available in the English PDF.

Referenced standards

Normative references

ISO 25178

Cited by

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