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GB/T 40066-2021Nanotechnologies—Thickness measurement of graphene oxide—Atomic Force Microscopy (AFM) (English PDF)

纳米技术 氧化石墨烯厚度测量 原子力显微镜法

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Issued by

SAMR; SAC

Level / Type

National · Recommended

Issue date

May 21, 2021

Implementation date

December 1, 2021

Scope

GB/T 40066-2021 is the English-translated version of 纳米技术 氧化石墨烯厚度测量 原子力显微镜法.

GB/T 40066-2021 describes how to measure the thickness of graphene oxide flakes with atomic force microscopy.

The sample is laid flat on a mica substrate, the surface is scanned in tapping mode, and the step height between flake and substrate is taken as the thickness, calculated either by fitting straight lines to the upper and lower steps or from height probability histograms with Gaussian fitting.

The standard specifies the reagents and equipment, sample preparation conditions, scan settings, the number of flakes and profiles to measure, background subtraction, uncertainty and the test report, with worked examples of both methods in the annexes.

It applies to flakes at least 300 nm across, and can be used as a reference for other two-dimensional materials. It was issued on 21 May 2021 and has applied since 1 December 2021.

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Document preview — GB/T 40066-2021

National Standard of the People's Republic of China

ICS
17.180
Classification
A 40

Issued by: State Administration for Market Regulation; Standardization Administration of the PRC

Contents

  • Foreword
  • Introduction
  • 1 Scope
  • 2 Normative references
  • 3 Terms and definitions
  • 4 Principles and calculation methods
  • 5 Reagents and materials
  • 6 Instruments and equipment
  • 7 Sample preparation
  • 8 Measurement step
  • 9 Result calculation
  • 10 Application of Graphene Oxide Thickness Measurement
  • 11 Uncertainty
  • 12 Test report
  • Appendix A (informative appendix) Method 1 example
  • Appendix B (informative appendix) Method 2 example
  • Appendix C (informative appendix) Graphene oxide thickness measurement application
  • Appendix D (informative appendix) Method 1 test report format
  • Appendix E (informative appendix) Method 2 test report format
  • Reference

1 Scope

This standard specifies the sample preparation, measurement procedures, and calculation of results for the atomic force microscopy (AFM) measurement of graphene oxide thickness.

This standard is applicable to the measurement of the thickness of graphene oxide with a diameter of not less than 300nm. AFM measurement of thickness of other two-dimensional materials The amount can be used by reference.

2 Normative references

The following documents are indispensable for the application of this document. For dated reference documents, only the dated version applies to this document. For undated reference documents, the latest version (including all amendments) is applicable to this document.

GB/T 27760 Method for calibrating sub-nano height measurement of atomic force microscope using Si(111) crystal plane atomic steps

GB/T 30544.13 Nanotechnology terminology Part 13: Graphene and related two-dimensional materials

JJF1351 Scanning Probe Microscope Calibration Specification

3 Terms and definitions

The terms and definitions defined in GB/T 27760, GB/T 30544.13 and JJF1351 apply to this document. For ease of use, the following Some terms and definitions in GB/T 30544.13 are repeatedly listed.

3.1 Graphene oxide; GO

The chemically modified graphene obtained after oxidation and exfoliation of graphite has a base plane that has been strongly oxidized.

Note: Graphene oxide is a single-layer material with high oxygen content, usually characterized by the carbon-oxygen atomic ratio (related to the synthesis method, generally about 2.0). [GB/T 30544.13-2018, definition 3.1.2.13]

4 Principles and calculation methods

4.1 Principle

Lay the graphene oxide sample flat on the substrate, use AFM to characterize the surface morphology of the graphene oxide and the substrate, and then use the software to perform The line background is subtracted to obtain the contour line, and the height difference between the upper step and the lower step is measured, which is the thickness of the graphene oxide sample. Calculated height The poor methods are divided into 4.2 and 4.3.

4.2 Calculation Method One

The coordinates of each point of the upper and lower steps in the contour line are linearly fitted by the least square method, and two fitted straight lines (see Figure 1) and the pair are obtained. The corresponding fitting parameters a1, b1, a2, b2.Calculate the height difference H of the upper and lower steps by formula (1), which is the difference between the upper straight line and the lower straight line at point xT distance.

4.3 Calculation Method Two

The corresponding data on both sides of the steps formed by the graphene oxide and the substrate is converted into a height probability distribution histogram (see Figure 2), using Gaussian simulation The normal distribution curve is obtained together, and the difference of the x-coordinate between the height peaks on both sides is the thickness of the sample, and the thickness value is calculated by formula (2).

Note: The probability distribution histogram of the height data, where the black histogram represents the probability distribution of graphene oxide height, and the blue histogram represents the height of the substrate. The red line is the Gaussian fitting line obtained according to the formula in the figure. The upper and lower x are graphene oxide and the substrate obtained by Gaussian fitting The maximum value of the probability distribution of the height reached, the difference between the two is the sample thickness value.

5 Reagents and materials

5.1 Mica sheet. The surface flatness is atomic level.

5.2 Ultrapure water. conductivity is not more than 0.1µs/cm.

5.3 Ethanol. analytically pure.

6 Equipment

6.1 Atomic force microscope. the vertical direction (z direction) resolution is better than 0.1nm, and the number of scan lines in a single picture is not less than 500.

6.2 Ultrasonic disperser. power is not more than 300W.

6.3 Others. analytical balance, pipette, glass petri dish, tape, etc.

7 Sample preparation

7.1 The conditions of the sample preparation environment are temperature 20°C~30°C and relative humidity not higher than 65%.

7.2 The environment and utensils should be kept clean during the sample preparation process, and pollutants should be avoided as much as possible.

7.3 Ensure that the prepared samples can be dispersed independently, and there is no stacking between the layers. Refer to Appendix A for sample preparation methods.

8 Measurement steps

8.1 The calibration of the atomic force microscope should comply with the regulations of JJF1351.

8.2 AFM scan parameters are set to tap mode, the number of scan lines is greater than 500, such as 512 or 1024, and the scan range is generally 10µm ×10µm or less.

8.3 Select a clear test image and save its original test data. In order to ensure the representativeness of the sample, at least 3 should be selected on the surface of the mica Graphene oxide in different effective areas is tested, a total of at least 10 (m) independent samples are selected for thickness measurement, and each sample is measured at least Try 3 (n) contour lines.

Note: m and n are applicable to 11.1 Chinese formula (3).

9 Result calculation

9.1 Background deduction

Perform the background subtraction operation on the AFM original image of the selected sample (see Appendix A), and the height of the substrate baseline on both sides of the measured area can be obtained. Image with consistent degree (see Figure 3).

Appendix B (Informative appendix) Method two example

B.1 Experiment content

Example 2 of graphene oxide thickness measurement.

B.2 Sample preparation

Refer to A.2, A.3, A.4, A.5 for sample preparation, measurement steps, background subtraction, and contour selection process.

B.3 Data processing

Use the software analysis function to convert the height data on both sides of each selected step (base and sample) into height probability distributions. Rectangular graph, Gaussian fitting to get the maximum value of the probability distribution of the height of the base and the sample. Refer to the description of the analysis software used for specific processing methods. Recommended software Igor, Origin, Excel, etc.

Take the Igor software as an example, select the Histogram option in the Analysis menu bar, manually select Sourcewave and the corresponding outputwave; then set bins related parameters according to the data in Sourcewave, including the number of bins, the starting value of bins, and The width of the bin. The width of the bin is determined by the number of data in Sourcewave. Generally, the less the data, the smaller the bin value, so It can ensure the measurement of the thickness of a small area sample. The specific operations are as follows.

a) Import the base and sample height data respectively, see Figure B.1;

b) The height probability distribution analysis is shown in Figure B.2;

c) The height probability distribution fitting is shown in Figure B.3.

......
This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 19 pages — is available in the English PDF.

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