GB/T 24574-2009Test methods for photoluminescence analysis of single crystal silicon for III-V impurities (English PDF)
硅单晶中Ⅲ-Ⅴ族杂质的光致发光测试方法
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Issued by
Standardization Administration of China
Level / Type
National · Recommended
Issue date
October 30, 2009
Implementation date
June 1, 2010
Scope
GB/T 24574-2009 is the English-translated version of 硅单晶中Ⅲ-Ⅴ族杂质的光致发光测试方法.
GB/T 24574-2009 — This standard specifies the test methods photoluminescent silicon single crystal III-V family impurities. This standard applies to the determination of low dislocation single crystal silicon conductive impurity of boron and phosphorus content at the same time.
The standard for the detection of single crystal silicon in an amount of 1 × 1011at · cm-3 ~ 5 × various electrically active impurity elements 1015at · cm-3's.
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Document preview — GB/T 24574-2009
National Standard of the People's Republic of China
- ICS
- 29.045
- Classification
- H 80
Issued by: Standardization Administration of China
Contents
- What this standard covers1
- Document data2
- Standards quoted by this document3
What this standard covers
This standard specifies the silicon single product in ��-�� photoluminescence testing methods ethnic impurities. This standard applies to the determination of low dislocation single crystal silicon impurity conductivity of boron and phosphorus content simultaneously. This standard is used to detect a single product silicon content of 1 �� 10^(11) at �� cm^(-3) ~ 5 �� 10^(15) at �� cm^(-3) for a variety of electrically active impurity elements.
Document data
International classification (ICS): 29.045.
Chinese classification (CCS): H80.
Estimated length of the Chinese original: 12,122 words.
Adopted international standard: SEMI MF1389-0704, MOD.
Standards quoted by this document
GB/T 13389; GB/T 24581
......
This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 8 pages — is available in the English PDF.
Referenced standards
Normative references
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Related Standards
GB/T 13389-2014 — Practice for conversion between resistivity and dopant density for boron-doped, phosphorus-doped, and arsenic-doped silicon
GB/T 24581-2022 — Test method for III and V impurities content in single crystal silicon—Low temperature FT-IR analysis method
GB/T 3402.2-2026 — Plastics - Homopolymer and copolymer resins of vinyl chloride - Part 2: Preparation of test samples and determination of properties
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