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YS/T 719-2009Flat magneting sputtering target. Silicon target for optical coating (English PDF)

平面磁控溅射靶材光学薄膜用硅靶

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Issued by

Ministry of Industry and Information Technology

Level / Type

National · Recommended

Issue date

December 4, 2009

Implementation date

June 1, 2010

Scope

YS/T 719-2009 is the English-translated version of 平面磁控溅射靶材光学薄膜用硅靶.

YS/T 719-2009 — This standard specifies the optical thin film planar magnetron sputtering using a silicon target requirements, test methods, inspection rules, marking, packaging, transportation and storage and purchase order (or contract) content. This standard applies to planar magnetron sputter optical film silicon target.

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Document preview — YS/T 719-2009

National Standard of the People's Republic of China

ICS: 77.150.99
Classification: H 63

Issued by: Ministry of Industry and Information Technology

What this standard covers1
Document data2
Standards quoted by this document3

What this standard covers

This standard specifies the planar magnetron sputtering target of optical thin film silicon requirements, test methods, inspection rules, marking, packaging, transportation, storage and purchase order (or contract) content. This standard applies to planar magnetron sputtering optical thin film silicon target.

Document data

International classification (ICS): 77.150.99.

Chinese classification (CCS): H63.

Estimated length of the Chinese original: 6,633 words.

Standards quoted by this document

GB/T 1551; GB/T 2040; GB/T 5121; GB/T 5231; GB/T 12963

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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 4 pages — is available in the English PDF.

Referenced standards

Normative references

GB/T 5121

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