GB/T 34504-2017Measurement method for surface metal contamination on sapphire polished substrate wafer (English PDF)
蓝宝石抛光衬底片表面残留金属元素测量方法
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Issued by
General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China
Level / Type
National · Recommended
Issue date
October 14, 2017
Implementation date
May 1, 2018
Scope
GB/T 34504-2017 is the English-translated version of 蓝宝石抛光衬底片表面残留金属元素测量方法.
GB/T 34504-2017 — This standard specifies the sapphire polishing substrate surface depth of 5nm residual metal elements total reflection X-ray fluorescence spectrometry Test method.
This standard applies to sapphire polishing substrate surface residual, in the periodic table 11 (Na) ~ 92 (U) (remove aluminum and oxygen), and the areal density is between 109 atoms/cm2 and 1015 atoms/cm2.
Other uses Sapphire polishing surface residual the measurement of remaining metal elements can be performed with reference to this standard.
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Document preview — GB/T 34504-2017
National Standard of the People's Republic of China
- ICS
- 77.040
- Classification
- H 17
Issued by: General Administration of Quality Supervision, Inspection and Quarantine of the People's Republic of China, Standardization Administration of the People's Republic of China
Contents
- Document data1
Document data
International classification (ICS): 77.040.
Chinese classification (CCS): H17.
Estimated length of the Chinese original: 14,138 words.
......
This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 9 pages — is available in the English PDF.
Referenced standards
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