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GB/T 31352-2014Test methods for warp of sapphire substrates (English PDF)

蓝宝石衬底片翘曲度测试方法

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Issued by

SAMR; SAC

Level / Type

National · Recommended

Issue date

December 31, 2014

Implementation date

September 1, 2015

Scope

GB/T 31352-2014 is the English-translated version of 蓝宝石衬底片翘曲度测试方法.

GB/T 31352-2014 is the Chinese standard "Test methods for warp of sapphire substrates". Its scope clause reads: This standard specifies the sapphire cutting discs, abrasive sheet, polished (hereinafter referred to as sapphire substrate sheet) Test Method for warping degree.

This standard applies to the diameter of 50.8mm ~ 304.8mm, thickness not less than 200µm test piece warpage of the sapphire substrate. Its clauses include terms and definitions; method summary.

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Document preview — GB/T 31352-2014

National Standard of the People's Republic of China

ICS
77.040.99
Classification
H 21

Issued by: State Administration for Market Regulation; Standardization Administration of the PRC

Contents

  • 1 Scope
  • 2 Normative references
  • 3 Terms and Definitions
  • 4 Method summary

1 Scope

This standard specifies the sapphire cutting discs, abrasive sheet, polished (hereinafter referred to as sapphire substrate sheet) Test Method for warping degree.

This standard applies to the diameter of 50.8mm ~ 304.8mm, thickness not less than 200µm test piece warpage of the sapphire substrate.

2 Normative references

The following documents for the application of this document is essential. For dated references, only the dated version suitable for use herein

Member. For undated references, the latest edition (including any amendments) applies to this document.

GB/T 2828.1 Sampling procedures for inspection - Part 1. by acceptance quality limit (AQL) retrieval batch inspection sampling plan

GB/T 6620 wafer warpage non-contact test method

GB/T 14264 semiconductor material terms

3 Terms and Definitions

GB/T 14264 and defined by the following terms and definitions apply to this document.

3.1 Warp

Free and holding the wafer difference between the maximum and the minimum distance between the planes and the reference plane planes.

3.2 The median plane datum plane

Designated by the wafer is less than the nominal diameter of the plane three equidistant points on the circumference of the diameter of the decision.

4 Method summary

4.1 Contact test

The sapphire substrate sheet is placed on the three fulcrum reference ring 3 forms a fulcrum reference plane, the use of low pressure along the displacement indicator

Sapphire substrate sheet measuring predetermined path distance from the reference plane, the record in pairs displacement indicator readings and find the difference, for a range of

Paired difference between the maximum and minimum values whichever is the difference divided by 2, which means that the value obtained warpage of the substrate sheet.

4.2 Non-contact test

The sapphire substrate sheet is placed on the three fulcrum reference ring 3 forms a fulcrum reference plane, the use of non-contact displacement sensor

Along a predetermined path sapphire substrate sheet measuring distance from the reference plane, the record in pairs displacement indicator readings and find the difference, for a series of

Tabulated values for the difference, whichever is the difference between maximum and minimum values divided by 2, which means that the value obtained warpage of the substrate sheet.

4.3 white light interferometric test

Sapphire laser irradiation surface of the substrate sheet, the light reflected through the superposition of interference, the interference pattern recorded by the optical imaging system, the level of the beginning of shape

Measurement appearance; in the Z-axis direction of the objective lens continues to move slightly, in each position thereof, the optical imaging system to collect image photographing, shaped […]

......
This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 15 pages — is available in the English PDF.

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