GB/T 31225-2014Test method for the thickness of silicon oxide on Si substrate by ellipsometer (English PDF)
椭圆偏振仪测量硅表面上二氧化硅薄层厚度的方法
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Issued by
SAMR; SAC
Level / Type
National · Recommended
Issue date
September 30, 2014
Implementation date
April 15, 2015
Scope
GB/T 31225-2014 is the English-translated version of 椭圆偏振仪测量硅表面上二氧化硅薄层厚度的方法.
GB/T 31225-2014 is the Chinese standard "Test method for the thickness of silicon oxide on Si substrate by ellipsometer". Its scope clause reads: This standard gives a continuous variable wavelength, variable angle spectroscopic ellipsometer type silicon dioxide layer thickness measurements on silicon surfaces method.
This standard applies to the test silicon substrate thickness uniform, isotropic, 10nm ~ 1000nm thick silicon dioxide layer thickness, other Monolayer on the substrate dielectric film thickness measurement test sample at a wavelength of opaque can refer to this method. Its clauses include terms and definitions; works.
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Document preview — GB/T 31225-2014
National Standard of the People's Republic of China
- ICS
- 17.040.01
- Classification
- J 04
Issued by: State Administration for Market Regulation; Standardization Administration of the PRC
Contents
- 1 Scope
- 2 Normative references
- 3 Terms and Definitions
- 4 works
1 Scope
This standard gives a continuous variable wavelength, variable angle spectroscopic ellipsometer type silicon dioxide layer thickness measurements on silicon surfaces method.
This standard applies to the test silicon substrate thickness uniform, isotropic, 10nm ~ 1000nm thick silicon dioxide layer thickness, other
Monolayer on the substrate dielectric film thickness measurement test sample at a wavelength of opaque can refer to this method.
2 Normative references
The following documents for the application of this document is essential. For dated references, only the dated version suitable for use herein
Member. For undated references, the latest edition (including any amendments) applies to this document.
JJF1059.1-2012 Evaluation and Expression of Uncertainty in Measurement
3 Terms and Definitions
The following terms and definitions apply to this document.
3.1 Ellipsometry technique elipsometer
Use change in the polarization state of the polarized light beam reflected or transmitted when appearing on the screen and film studies between two media interface or film made
An optical method for raw phenomena and their properties.
3.2 Fresnel reflection law
When natural light is incident on the interface, can be decomposed into two equal and mutually perpendicular plane polarized light to s indicate normal incidence
Surface, p represents a parallel incident surface, and the vibration component s and p components are independent of each other.
3.3 Linearly polarized light
Light vector vibration in one direction only, that is, the propagation of light in the process of vibration of the electric vector is limited to within a defined plane, also known as partial plane
Polarized light.
3.4 Elliptically polarized
The same two frequencies, the vibration direction perpendicular to each other and the spread of synthetic linearly polarized in the same direction, and the endpoint of its electric vector in an inner surface wave
An elliptical trajectory is depicted.
4 works
Elliptic functions rho ellipsometry technique available film showing the reflection film is formed ellipsometry polarization characteristics, can be expressed as the formula (1) and (2).
......
This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 15 pages — is available in the English PDF.
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