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GB/T 26307-2025Silver target (English PDF)

银靶材

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Issued by

SAMR; SAC

Level / Type

National · Recommended

Issue date

August 29, 2025

Implementation date

March 1, 2026

Scope

GB/T 26307-2025 is the English-translated version of 银靶材.

GB/T 26307-2025 is the Chinese national standard covering the silver sputtering target — the purity and the impurity limits, the density and the grain size and orientation that decide how evenly it erodes, the dimensions and flatness, the bonding to the backing plate and its ultrasonic inspection, and the surface finish. It replaces GB/T 26307-2010, under the China Nonferrous Metals Industry Association. In force from 1 March 2026. Issued on 29 August 2025, it has been in force since 1 March 2026, replacing GB/T 26307-2010.

Document preview — GB/T 26307-2025

National Standard of the People's Republic of China

ICS
77.150.99
Classification
H 68
Replacing
GB/T 26307-2010

Issued by: State Administration for Market Regulation; Standardization Administration of the PRC

Contents

  • Foreword
  • 1 Scope
  • 2 Normative references
  • 3 Terms and Definitions
  • 3.1 target
  • 3.2 targetblank
  • 3.3 backing plate

Foreword

This document complies with the provisions of GB/T 1.1-2020 "Standardization Work Guidelines Part 1: Structure and Drafting Rules of Standardization Documents". Drafting.

This document replaces GB/T 26307-2010 "Silver Target". Compared with GB/T 26307-2010, the main differences are structural adjustments and editorial changes.

In addition, the main technological changes are as follows.

a) Added terms and definitions (see Chapter 3);

(b) Added requirements for the classification and chemical composition of products with Ag99.995 purity, as well as the corresponding test methods (see 4.1.1, 5.1,...). 6.1);

c) Added requirements for product structure (see 4.1.2);

d) Added product marking requirements (see 4.2);

e) The grain size requirement has been changed from "the average lateral grain size of the silver target should be between 50 µm and 150 µm" to "the average lateral grain size of the product..." The particle size should not exceed 150 µm (see 5.2, 3.3 of the 2010 edition);

f) Added provisions regarding internal product quality requirements, testing methods, and the determination of test results (see 5.3, 6.3, and 7.4.2);

g) Added provisions regarding product welding quality requirements, test methods, and judgment of inspection results (see 5.5, 6.5, and 7.4.2);

h) The product dimensions and their tolerance requirements have been changed from overall product dimensions to product dimensions excluding the back panel (see [link]).

5.6 (3.6 in the 2010 version);

i) The product grain size analysis method has been changed, and Appendix A, "Detection Method for On-site Metallographic Determination of the Transverse Average Grain Size of a Silver Target," has been deleted.

(See 5.2, Appendix A of the 2010 edition);

j) Product inspection items and sampling requirements have been added (see 7.3);

k) Added relevant content to the product accompanying documents and order forms (see 8.3, Chapter 9).

Please note that some content in this document may involve patents. The issuing organization of this document assumes no responsibility for identifying patents.

This document was proposed by the China Nonferrous Metals Industry Association.

This document is under the jurisdiction of the National Technical Committee on Standardization of Nonferrous Metals (SAC/TC243).

This document was drafted by: GRINM Advanced Materials Co., Ltd., Jinchuan Group Co., Ltd., and Yunnan Precious Metals New Materials Holding Group.

Group Co., Ltd., Zijin Mining Group Gold Smelting Co., Ltd., GRINM Advanced Materials (Shandong) Co., Ltd., GRINM Resources and Environment Technology Co., Ltd.

Technology Research Institute (Beijing) Co., Ltd.

The main drafters of this document are: Song Qi, He Jinjiang, Wan Xiaoyong, Yang Xiaoyan, Wen Ming, Wu Weihuang, Zhu Ziyi, Yuan Xuetao, Zhang Yadong, and Shang Zaiyan.

Wang Chuanjun, Ying Zongbo, Zhang Xiaona, Xu Guojin, Xin Baipu, Liu Dan.

This document was first published in 2010, and this is its first revision. Silver sputtering target

1 Scope

This document specifies the classification and marking, technical requirements, test methods, inspection rules and marking, packaging, transportation, storage and accompanying materials for silver sputtering targets.

Documents and purchase orders.

This document applies to all types of silver sputtering targets used in semiconductor devices. Silver targets for other applications should refer to this document for further information.

2 Normative references

GB/T 1031

GB/T 4135

GB/T 6394

GB/T 8651

GB/T 11067

GB/T 15077

GB/T 36590

GB/T 39810

3 Terms and Definitions

The following terms and definitions apply to this document.

3.1 target

The cathode portion in sputter deposition technology.

Note. The cathode material is deposited on the anode surface in the form of molecules, atoms or ions, detached from the cathode under the impact of positively charged cations.

3.2 targetblank

The portion of the cathode used as the target material.

3.3 backing plate

The part used to support or fix the target blank.

Note. The target material and the backing plate are connected by brazing.

......
This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 15 pages — is available in the English PDF.

Referenced standards

Editions of GB/T 26307

EditionTitleRevisionStatus
GB/T 26307-2025Siver targetcurrent editionCurrent
GB/T 26307-2010Silver targetprevious editionIn force

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