GB/T 20176-2006Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials (English PDF)
表面化学分析 二次离子质谱 用均匀掺杂物质测定硅中硼的原子浓度
GB/T 20176 | Evolution and historical versions
| Std ID | Title | Status |
|---|---|---|
| GB/T 20176-2025 | Surface chemical analysis—Secondary-ion mass spectrometry—Determination of boron atomic concentration in silicon using uniformly doped materials | Valid |
| GB/T 20176-2006 | Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials | Obsolete |
GB/T 20176-2006 is obsolete. It has been replaced by GB/T 20176-2025. This page sells the obsolete edition, for projects and contracts that still cite it.
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Issued by
Standardization Administration of China
Level / Type
National · Recommended
Issue date
March 27, 2006
Implementation date
November 1, 2006
Scope
GB/T 20176-2006 is the English-translated version of 表面化学分析 二次离子质谱 用均匀掺杂物质测定硅中硼的原子浓度.
GB/T 20176-2006 is the Chinese national standard "Surface chemical analysis - Secondary-ion mass spectrometry - Determination of boron atomic concentration in silicon using uniformly doped materials".
It was issued on March 27, 2006 by the Standardization Administration of China, and took effect on November 1, 2006. It is obsolete: it has been replaced by GB/T 20176-2025.
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Document preview — GB/T 20176-2006
National Standard of the People's Republic of China
Issued by: Standardization Administration of China
Contents
- Document data
1 Document data
Sector: National standard (Recommended).
Issuing body: Standardization Administration of China.
Date of issue: 2006-03-27.
Date of implementation: 2006-11-01.
Status: obsolete, replaced by GB/T 20176-2025.
......
This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — all pages — is available in the English PDF.
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