YS/T 935-2013Standard guide for analysis and reporting the impurity content and grade of high purity metallic sputtering targets for electronic thin film applications (English PDF)

YS/T 935-2013 is the English-translated version of 电子薄膜用高纯金属溅射靶材纯度等级及杂质含量分析和报告标准指南.

YS/T 935-2013 — This standard specifies the electronic film prepared by sputtering targets of high purity metal purity levels defined method, impurity content analysis methods, sampling Rules and target purity grade reporting standards and so on.

This standard applies to all types of electronic film with a high purity metal sputtering target (hereinafter referred to as the target). Other requirements for a higher purity target Degree of purity, impurity content analysis and report specifications can also refer to use.

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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 4 pages — is available in the English PDF.

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