SJ/T 12023-2025Semiconductor equipment - Testing methods for chemical vapor deposition (CVD) equipment used in integrated circuit manufacturing (English PDF)
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Issued by
Ministry of Industry and Information Technology
Level / Type
National · Recommended
Issue date
September 9, 2025
Implementation date
March 1, 2026
Scope
SJ/T 12023-2025 (Semiconductor equipment - Testing methods for chemical vapor deposition (CVD) equipment used in integrated circuit manufacturing) is available as an English-translated PDF.
SJ/T 12023-2025 — This standard specifies the testing methods for chemical vapor deposition (CVD) equipment used in integrated circuit manufacturing.
This standard is applicable to the testing of CVD equipment used in integrated circuit manufacturing at the stages of technology development, factory testing, client verification, and third-party testing.
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Document preview — SJ/T 12023-2025
National Standard of the People's Republic of China
- ICS
- 31.550
- Classification
- L 97
Issued by: Ministry of Industry and Information Technology
Contents
- What this standard covers1
- Document data2
What this standard covers
This standard specifies the testing methods for chemical vapor deposition (CVD) equipment used in integrated circuit manufacturing. This standard is applicable to the testing of CVD equipment used in integrated circuit manufacturing at the stages of technology development, factory testing, client verification, and third-party testing. CVD equipment or other stages of testing used in other semiconductor product manufacturing can be used as a reference.
Document data
International classification (ICS): 31.550.
Chinese classification (CCS): L97.
Estimated length of the Chinese original: 16,138 words.
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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 11 pages — is available in the English PDF.
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