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SJ/T 11829.1-2022Plasma-enhanced chemical vapor deposition (PECVD) equipment for crystalline silicon photovoltaic cells - Part 1: Tubular PECVD equipment (English PDF)

晶体硅光伏电池用等离子体增强化学气相淀积（PECVD）设备第1部分：管式 PECVD 设备

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Issued by

Ministry of Industry and Information Technology

Level / Type

National · Recommended

Issue date

September 30, 2022

Implementation date

January 1, 2023

Scope

SJ/T 11829.1-2022 is the English-translated version of 晶体硅光伏电池用等离子体增强化学气相淀积（PECVD）设备第1部分：管式 PECVD 设备.

SJ/T 11829.1-2022 — This standard specifies the terms and definitions, model designation, working environment, requirements, inspection methods, inspection rules, and packaging, marking, handling, transportation, and storage of tubular plasma-enhanced chemical vapor deposition (PECVD) equipment for crystalline silicon photovoltaic cells. wait.

This document applies to tubular PECVD equipment for crystalline silicon photovoltaic cells.

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Document preview — SJ/T 11829.1-2022

National Standard of the People's Republic of China

Issued by: Ministry of Industry and Information Technology

What this standard covers1
Document data2

What this standard covers

This standard specifies the terms and definitions, model designation, working environment, requirements, inspection methods, inspection rules, and packaging, marking, handling, transportation, and storage of tubular plasma-enhanced chemical vapor deposition (PECVD) equipment for crystalline silicon photovoltaic cells. wait. This document applies to tubular PECVD equipment for crystalline silicon photovoltaic cells. The product is mainly used for the deposition and hydrogen passivation of anti-reflection film and passivation film on crystalline silicon photovoltaic cells.

Document data

Estimated length of the Chinese original: 18,199 words.

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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 12 pages — is available in the English PDF.

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