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SJ/T 11503-2015Test methods for measuring surface roughness of polished monocrystalline silicon carbide wafers (English PDF)

碳化硅单晶抛光片表面粗糙度的测试方法

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Issued by

Ministry of Industry and Information Technology

Level / Type

National · Recommended

Issue date

April 30, 2015

Implementation date

October 1, 2015

Scope

SJ/T 11503-2015 is the English-translated version of 碳化硅单晶抛光片表面粗糙度的测试方法.

SJ/T 11503-2015 — This Standard specifies the test silicon carbide single crystal polished surface roughness comprising surface profiler and atomic force microscopy.

This Standard applies to silicon carbide single product polished surface roughness testing.

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Document preview — SJ/T 11503-2015

National Standard of the People's Republic of China

ICS: 29.045
Classification: H 83

Issued by: Ministry of Industry and Information Technology

What this standard covers1
Document data2
Standards quoted by this document3

What this standard covers

This Standard specifies the test silicon carbide single crystal polished surface roughness comprising surface profiler and atomic force microscopy. This Standard applies to silicon carbide single product polished surface roughness testing. Among them, the atomic force microscope method applies only after chemical mechanical polishing or optically polished and the surface roughness of the ups and downs in a few tenths of a micron wide silicon carbide single crystal polished.

Document data

International classification (ICS): 29.045.

Chinese classification (CCS): H83.

Estimated length of the Chinese original: 12,144 words.

Standards quoted by this document

GB/T 14264; GB/T 25915.1-2010

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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 8 pages — is available in the English PDF.

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