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SJ/T 11492-2015Test methods for measurement of composition of gallium arsenide phosphide wafers by photoluminescence (English PDF)

光致发光法测定磷镓砷晶片的组分

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Issued by

Ministry of Industry and Information Technology

Level / Type

National · Recommended

Issue date

April 30, 2015

Implementation date

October 1, 2015

Scope

SJ/T 11492-2015 is the English-translated version of 光致发光法测定磷镓砷晶片的组分.

SJ/T 11492-2015 — This Standard specifies the method using photoluminescence testing system for surface treatment of phosphorus-gallium arsenic (GaAs1-xPx) wafer component for testing.

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Document preview — SJ/T 11492-2015

National Standard of the People's Republic of China

ICS
29.045
Classification
H 83

Issued by: Ministry of Industry and Information Technology

Contents

  • What this standard covers1
  • Document data2

What this standard covers

This Standard specifies the method using photoluminescence testing system for surface treatment of phosphorus-gallium arsenic (GaAs1-xPx) wafer component for testing. This Standard applies to vapor phase epitaxial growth, photoluminescence peak (�PL) when within the range of 640nm ~ 670nm, corresponding to phosphorus molar fraction of 36% to 42% of the n-type GaAs1-xPx wafer.

Document data

International classification (ICS): 29.045.

Chinese classification (CCS): H83.

Estimated length of the Chinese original: 12,123 words.

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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 8 pages — is available in the English PDF.

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