GB/T 48095-2026Measurement method for topographic parameters of high-aspect-ratio microstructures utilize microscopic interferometry (English PDF)

GB/T 48095-2026 is the English-translated version of 高深宽比微结构形貌参数显微干涉测量方法.

This standard describes a measurement method that uses microscopic interferometry to determine topographic parameters of high-aspect-ratio microstructures. Such structures, which are deep and narrow compared with their width, occur in micro-electromechanical devices, microfluidics and semiconductor processing, and they are hard to measure. The document is intended for metrology laboratories, MEMS manufacturers, instrument makers and researchers.

The Chinese Academy of Sciences is the responsible body, and the standard takes effect on 1 March 2027. It is a recommended national standard (GB/T), so it is voluntary unless adopted in a contract or internal procedure. A published method supports consistent reporting of feature profiles between laboratories and between suppliers and customers. Readers should consult the full text for the specific parameters and the measurement approach it prescribes.

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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 24 pages — is available in the English PDF.

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