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GB/T 44919-2024Micro-electromechanical systems(MEMS) technology - Bulge test method for measuring mechanical properties of thin films (English PDF)

微机电系统(MEMS)技术 薄膜力学性能的鼓胀试验方法

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Issued by

State Administration for Market Regulation, China National Standardization Administration

Level / Type

National · Recommended

Issue date

November 28, 2024

Implementation date

November 28, 2024

Scope

GB/T 44919-2024 is the English-translated version of 微机电系统(MEMS)技术 薄膜力学性能的鼓胀试验方法.

GB/T 44919-2024 — This document describes the bulge test method for window films. Specimens are made from micro/nanostructured thin film materials including metals, ceramics, and Polymer films are used in micro-electromechanical systems (MEMS), micro-machines and other fields.

The film thickness ranges from 0.1 µm to 10 µm. Square the width of the rectangular window ranges from 0.5 mm to 4 mm, and the diameter of the circular window ranges from 0.5 mm to 4 mm.

This document is applicable to elastic modulus and residual stress testing of window film samples under normal temperature conditions by applying uniform pressure to them.

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Document preview — GB/T 44919-2024

National Standard of the People's Republic of China

ICS
31.080.99
Classification
L 59

Issued by: State Administration for Market Regulation, China National Standardization Administration

Contents

  • 1 Scope1
  • 2 Normative references1
  • 3 Terms, definitions and symbols1
  • 3.1 Terms and Definitions1
  • 3.2 Symbols2
  • 4 Principle of bulge test2
  • 5 Test equipment and test environment3
  • 5.1 General Principles3
  • 5.2 Device3
  • 5.3 Test Environment4
  • 6 Samples4
  • 6.1 General Principles4
  • 6.2 Specimen shape and size4
  • 6.3 Sample size measurement5
  • 7 Test Procedure and Analysis5
  • 7.1 Test Procedure5
  • 7.2 Data Analysis6
  • 8 Test Report7
  • Appendix A (Informative) Determination of Mechanical Properties8
  • A.1 Overview8
  • A.2 Determination of mechanical properties using stress-strain curves8
  • A.3 Determination of mechanical properties using load-deflection analysis9
  • Appendix B (Informative) Deformation Measurement Technology11
  • B.1 Overview11
  • B.2 Laser Interferometry Technology11
  • B.3 Capacitive Measurement11
  • Appendix C (Informative) Sample Manufacturing Example. MEMS Process16
  • C.1 Sample preparation16
  • C.2 Sample shape measurement16
  • References17

Foreword

This document is in accordance with the provisions of GB/T 1.1-2020 "Guidelines for standardization work Part 1: Structure and drafting rules for standardization documents" Drafting is required.

This document is equivalent to IEC 62047-17:2015 "Semiconductor devices - Microelectromechanical devices - Part 17: Determination of mechanical properties of thin films" "Test Methods".

The following minimal editorial changes were made to this document.

In order to coordinate with the existing standards, the name of the standard was changed to "Micro-electromechanical systems (MEMS) technology - Bulging test of mechanical properties of thin films" method";

Corrected a typographical error in the International Standard by changing the reference to "Annex B" in 6.1 to "Annex C". -

1 Scope

This document describes the bulge test method for window films. Specimens are made from micro/nanostructured thin film materials including metals, ceramics, and Polymer films are used in micro-electromechanical systems (MEMS), micro-machines and other fields. The film thickness ranges from 0.1 µm to 10 µm. Square the width of the rectangular window ranges from 0.5 mm to 4 mm, and the diameter of the circular window ranges from 0.5 mm to 4 mm.

This document is applicable to elastic modulus and residual stress testing of window film samples under normal temperature conditions by applying uniform pressure to them.

2 Normative references

The contents of the following documents constitute the essential clauses of this document through normative references in this document.

For referenced documents without a date, only the version corresponding to that date applies to this document; for referenced documents without a date, the latest version (including all amendments) applies.

in this document.

IEC 62047-2:2006 Semiconductor devices Micro-electromechanical devices Part 2: Tensile test methods for thin film materials (Semicon-ductor devices-Micro-electromechanical devices-Part 2: Tensile testing method of thin film materi-als)

3 Terms, definitions and symbols

3.1 Terms and Definitions

The following terms and definitions apply to this document.

3.1.1

residual stress

sigma0

The stress that exists in a specimen in the absence of external loads.

3.1.2

Biaxial modulus

Elastic modulus under plane strain conditions.

3.1.3

Window film membrane window the tested area of the thin film specimen without supporting structure which is in direct contact with the pressurized medium.

Note. See Figure 1.

......
This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 17 pages — is available in the English PDF.

Referenced standards

Normative references

IEC 62047

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