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GB/T 44759-2024High purity nickel target (English PDF)

高纯镍靶材

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Issued by

SAMR; SAC

Level / Type

National · Recommended

Issue date

October 26, 2024

Implementation date

May 1, 2025

Scope

GB/T 44759-2024 is the English-translated version of 高纯镍靶材.

GB/T 44759-2024 is the Chinese national standard covering the nickel sputtering target that feeds a semiconductor deposition tool — the round and square shapes or the buyer's own drawing, the Ni4N, Ni4N5 and Ni5N grades, the composite target on its backing plate and the monolithic one, the chemical composition, the test methods, the inspection rules, the marking, packaging, transport and storage, and the order content that has to be agreed before a target is cut. First edition, under the China Nonferrous Metals Industry Association. In force from 1 May 2025. Issued on 26 October 2024, it has been in force since 1 May 2025.

Document preview — GB/T 44759-2024

National Standard of the People's Republic of China

ICS: 77.150.40
Classification: H 62

Issued by: State Administration for Market Regulation; Standardization Administration of the PRC

Foreword
1 Scope
2 Normative references
3 Terms and Definitions
4 Categories
5 Technical Requirements
5.1 Chemical composition

Foreword

This document is in accordance with the provisions of GB/T 1.1-2020 "Guidelines for standardization work Part 1: Structure and drafting rules for standardization documents". Drafting is required.

Please note that some of the contents of this document may involve patents. The issuing organization of this document does not assume the responsibility for identifying patents.

This document is proposed by China Nonferrous Metals Industry Association.

This document is under the jurisdiction of the National Technical Committee on Standardization of Nonferrous Metals (SAC/TC 243).

This document was drafted by: Ningbo Jiangfeng Electronic Materials Co., Ltd., Jinchuan Group Co., Ltd., Youyan Yijin New Materials Co., Ltd.

Company, Shanghai Tongchuang Purun New Materials Co., Ltd., and Nanjing Damai Technology Industry Co., Ltd.

The main drafters of this document are: Yao Lijun, Bian Yijun, Liao Peijun, Hu Jiayan, Yang Huizhen, Wang Xueze, Zhou Youping, Yang Xiaoyan, Tang Ting, Wu Dongqing, Zhang Yadong, Zhu Ziyi, Wu Yuning, Gan Kejun, Zhong Chengming, Huang Yinchi, and Shi Xiaoxu. High purity nickel target

1 Scope

This document specifies the classification, technical requirements, test methods, inspection rules, marking, packaging, transportation, storage and accompanying materials of high purity nickel targets.

Line documents and order form contents.

This document applies to high purity nickel targets used in the semiconductor industry.

2 Normative references

GB/T 1031

GB/T 6394

GB/T 8651

GB/T 14265

GB/T 25915.1-2021

GB/T 39159

3 Terms and Definitions

The terms and definitions defined in GB/T 39159 apply to this document.

4 Categories

4.1 Products are divided into round and square shapes according to their appearance, or the purchaser can provide drawings.

4.2 The product is divided into three brands according to chemical composition. Ni4N, Ni4N5 and Ni5N.

4.3 Products are divided into composite targets and monomer targets according to their structural form. The structural diagram is shown in Figure 1.

a) Composite target b) Single target Description of index number. 1- Target blank; 2-Backboard.

Figure 1 Schematic diagram of target structure

5 Technical Requirements

5.1 Chemical composition

The chemical composition of the product shall comply with the requirements of Table 1 and Table 2.

......
This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 15 pages — is available in the English PDF.

Referenced standards

Normative references

GB/T 25915.1-2021

Editions of GB/T 44759

Edition	Title	Revision	Status
GB/T 44759-2024	High purity nickel target	current edition	Current

This page sells the current edition, GB/T 44759-2024. Earlier editions are listed for reference only.

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