GB/T 44538-2024Carbon based films - Determination of optical properties of amorphous carbon films by spectroscopic ellipsometry (English PDF)

Foreword

This document is in accordance with the provisions of GB/T 1.1-2020 "Guidelines for standardization work Part 1: Structure and drafting rules for standardization documents" Drafting is required.

This document modification adopts ISO 23216:2021 "Optical properties of amorphous carbon-based films by spectroscopic ellipsometry of carbon-based films".

This document has the following structural adjustments compared to ISO 23216:2021.

6.4 and 6.5 correspond to 6.4 in ISO 23216:2021; -6.6 corresponds to 6.5 in ISO 23216:2021.-the following editorial changes were made to this document.

Added the annotations of the types corresponding to each layer of the optical model in Figure 1; -Added title bar (see 5.1 to 5.7). -

1 Scope

This paper describes the use of spectroscopic ellipsometry to determine the optical properties of amorphous carbon-based films (refractive index n and extinction coefficient k) and the use of n-k diagrams A method for classifying different types of amorphous carbon-based films by spectroscopy.

This document applies to non-metallic materials deposited by ion evaporation, sputtering, arc deposition, plasma-assisted chemical vapor deposition, hot wire, etc.

Crystalline carbon-based films.

This document does not apply to amorphous carbon-based films modified by metals or silicon, or amorphous carbon with composition/property gradients through the film thickness.

Base film.

2 Normative references

This document has no normative references.

3 Terms and definitions

The following terms and definitions apply to this document.

Refractive index

The ratio of the speed of electromagnetic radiation in a vacuum to the speed of electromagnetic radiation in a medium.

Extinction coefficient the amount of electromagnetic radiation absorbed by a medium (matter).

4 Sample preparation

Amorphous carbon-based films on any substrate can be used for testing as long as the substrate is optically isotropic and has a usable optical model.

The test substrate is a mirror-finished silicon wafer. The mirror-finished silicon wafer can be used as a substrate for amorphous carbon films to meet different test requirements. The sample should be for uniform amorphous carbon-based films, the film thickness should be 0.02 µm~5 µm.

All relevant details of the sample should be provided, such as size, surface roughness, material type, composition, microstructure and processing process.

5 Equipment