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GB/T 44221-2024Determination of wavefront aberration in optical systems—Electro-optical Shack-Hartmann method (English PDF)

光学系统波前像差的测定夏克-哈特曼光电测量法

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Issued by

SAMR; SAC

Level / Type

National · Recommended

Issue date

July 24, 2024

Implementation date

February 1, 2025

Scope

GB/T 44221-2024 is the English-translated version of 光学系统波前像差的测定夏克-哈特曼光电测量法.

GB/T 44221-2024 is the Chinese national standard covering determination of wavefront aberration in optical systems, Electro-optical Shack-Hartmann method. Issued on 24 July 2024, it has been in force since 1 February 2025.

Document preview — GB/T 44221-2024

National Standard of the People's Republic of China

ICS: 17.180.99
Classification: L 50

Issued by: State Administration for Market Regulation; Standardization Administration of the PRC

PrefaceIII
1 Scope1
2 Normative references1
3 Terms and Definitions1
4 Measurement principles and methods2
4.1 Measurement Principle2
4.2 Measurement method of wavefront aberration of optical system2
4.3 Measurement of surface deviation of optical parts3
5 Measurement conditions4
5.1 Measurement Environment4
5.2 Samples4
6 Equipment and devices4
6.1 Measuring instrument4
6.2 Auxiliary lens5
7 Measurement steps5
7.1 Preparation before measurement5
7.2 Choice of wavefront reconstruction method6
7.3 Optical Path Alignment6
7.4 Measurement and Data Judgment6
8 Measurement data processing6
9 Measurement Report7
Appendix A (Informative) Wavefront Restoration Method8
Appendix B (Informative) Zernike Polynomial Sequences11
Appendix C (Informative) Measurement Report13
References14

Foreword

This document is in accordance with the provisions of GB/T 1.1-2020 "Guidelines for standardization work Part 1: Structure and drafting rules for standardization documents" Drafting is required.

Please note that some of the contents of this document may involve patents. The issuing organization of this document does not assume the responsibility for identifying patents.

This document was proposed by the Chinese Academy of Sciences.

This document is under the jurisdiction of the National Technical Committee for Standardization of Optical Measurement (SAC/TC 487).

This document was drafted by: Suzhou Institute of Biomedical Engineering and Technology, Chinese Academy of Sciences, Institute of Optoelectronics Technology, Chinese Academy of Sciences, Institute of Standardization, Institute of Space Information Innovation, Chinese Academy of Sciences, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Suzhou Huili Instrument Co., Ltd., China National Institute of Metrology, Changchun Optoelectronics Technology Co., Ltd., Zhejiang Sunny Optical Co., Ltd., Chengdu Keoda Optoelectronic Technology Co., Ltd., Suzhou Yiguang Instrument Co., Ltd., and Zhoushan Quality and Technical Supervision Inspection Institute.

The main drafters of this document are: Shi Guohua, Xing Lina, He Yi, Yang Jinsheng, Cai Jianqi, Wang Pu, Liu Chunyu, Han Sen, Hong Baoyu, Feng Changyou, Bao Mingdi, Ye Hong, Xie Guihua, Wu Kaijun, Shen Chenyan, Hao Huadong.

Measurement of wavefront aberration of optical system Shack-Hartmann photoelectric measurement method

1 Scope

This document describes the principle and method of measuring wavefront aberration of optical systems using the Shack-Hartmann method, the measurement conditions, equipment and devices, Measurement steps and measurement data processing.

This document is applicable to the measurement of wavefront aberration of optical systems using the Shack-Hartmann method, and is also applicable to the measurement of surface deviation of optical parts. Measurement.

2 Normative references

This document has no normative references.

3 Terms and definitions

The following terms and definitions apply to this document.

3.1 Wavefront

The isophase surface of light waves during propagation.

[Source. GB/T 13962-2009, 2.28]

3.2 Wavefront aberration

The deviation of a wavefront from the ideal wavefront.

[Source. GB/T 41869.2-2022, 3.1, modified]

3.3 surface form deviationsurface form deviation

The deviation of an optical surface under test relative to a reference optical surface. [Source. GB/T 2831-2009, 3.1]

3.4 Wavefront reconstruction

The process of obtaining the phase distribution of the incident wavefront by calculating the slope of the sub-aperture.

3.5 Diameter

The clear aperture of an optical part or system that an instrument can inspect.

3.6 Autocollimation method

The collimated light emitted by the collimator is irradiated on the sample, and then reflected back to the collimator by the sample, and the image near the focus is measured.

The method of tilting the sample, etc. can be used for alignment, focusing, and measuring small displacements and angles.

......
This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 23 pages — is available in the English PDF.

Editions of GB/T 44221

Edition	Title	Revision	Status
GB/T 44221-2024	Determination of wavefront aberration in optical systems - Electro-optical Shack-Hartmann method	current edition	Current

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