GB/T 32999-2016Surface chemical analysis -- Depth profiling -- Measurement of sputtering rate: mesh-replica method using a mechanical stylus profilometer (English PDF)

GB/T 32999-2016 is the English-translated version of 表面化学分析 深度剖析 用机械轮廓仪栅网复型法测量溅射速率.

GB/T 32999-2016 — This standard specifies the use of Auger electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS) to determine the depth of the ion sputtering rate analysis Method, the sample sputtering area range of 0.4mm2 ~ 3.0mm2.

This standard applies only to transversely uniform bulk materials or monolayers the ion sputtering rate is determined by the sputtering depth and the sputtering time, and the sputtering depth is measured by a mechanical probe profiler.

This standard provides a method of converting ion sputtering time in depth analysis into sputter depth and assuming a constant sputtering rate. This method is not designed for scanning probe microsystems and therefore can not be evaluated by scanning probe microscopy.

This method does not apply the sputtering area is less than 0.4 mm2 and is not suitable for sputtering-induced surface roughness compared to the sputtering depth of the measured area Case.

......
This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 16 pages — is available in the English PDF.

1. 1

   Add to cart

   Click "Download PDF" on this page and choose "Buy this standard". You can add more standards before checkout.

2. 2

   Checkout

   Enter your email and billing details. Payment is processed securely by Stripe (cards or bank transfer). Prefer bank details? Request a quotation (min. order $300).

3. 3

   Instant delivery (0–9 sec)

   Delivery is automatic: within seconds of payment you'll receive an email with a secure download link. The link stays valid for 72 hours.

4. 4

   Invoice included

   A tax invoice is attached to the confirmation email. Need a custom invoice? Contact us.