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GB/T 14849.5-2014Methods for chemical analysis of silicon metal—Part 5: Determination of impurity contents—X-ray fluorescence method (English PDF)

工业硅化学分析方法 第5部分:杂质元素含量的测定 X射线荧光光谱法

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Issued by

SAMR; SAC

Level / Type

National · Recommended

Issue date

December 5, 2014

Implementation date

May 1, 2015

Scope

GB/T 14849.5-2014 is the English-translated version of 工业硅化学分析方法 第5部分:杂质元素含量的测定 X射线荧光光谱法.

This Part of GB/T 14849 sets the X-ray fluorescence method for determining impurity contents in industrial silicon.

Clause 1 states that it stipulates, and is applicable to, the determination of iron, aluminum, calcium, manganese, nickel, titanium, copper, phosphorus, magnesium, chromium, vanadium and cobalt in industrial silicon, with the determination range given in Table 1.

Clause 3, Method summary, describes the wavelength dispersive measurement of the secondary characteristic radiation emitted by each element under primary X-ray excitation, resting on Bragg's theorem, with a standard curve of intensity against concentration and the necessary mathematical correction for matrix effects.

Clause 4 calls for a wavelength dispersive X-ray fluorescence spectrometer with an Rh target light tube, a vibration mill with a tungsten carbide grinding disc, a tablet press able to provide 40 t, a balance of 0.1 g sensitivity, boric acid or starch as binder, boric acid as lining agent and triethanolamine.

Clause 5 requires the specimen to pass a 0.149 mm standard sieve, and clause 6 has the operator weigh 15.0 g of specimen with 3.0 g of binder and three drops of triethanolamine, grind it on the vibrating mill until it passes a 0.074 mm sieve, press it at 30 t for 30 s into a sample not less than 4 mm thick, and take the average of two independent measurements.

The clauses that follow are headed Precision, Quality assurance and control and Test report, and the two informative appendices give the measurement condition parameters of two kinds of X-ray fluorescence spectrometers and the possible elemental interference spectral lines.

Clause 2 cites GB/T 8170. It replaces GB/T 14849.5-2010, was issued on December 5, 2014 and has applied since May 1, 2015.

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Document preview — GB/T 14849.5-2014

National Standard of the People's Republic of China

ICS
77.120.10
Classification
H 12
Replacing
GB/T 14849.5-2010

Issued by: State Administration for Market Regulation; Standardization Administration of the PRC

Contents

  • Foreword3
  • 1 Scope5
  • 2 Normative references5
  • 3 Method summary5
  • 4 Instruments and materials6
  • 5 Specimens6
  • 6 Steps7
  • 7 Precision8
  • 8 Quality assurance and control9
  • 9 Test report10
  • Appendix A (Informative) Measurement condition parameters of two kinds of X-ray fluorescence spectrometers11
  • Appendix B (Informative) Possible elemental interference spectral lines12

1 Scope

This Part of GB/T 14849 stipulates the determination method of iron, aluminum, calcium, manganese, nickel, titanium, copper, phosphorus, magnesium, chromium, vanadium, cobalt content in industrial silicon.

This Part is applicable to the determination of iron, aluminum, calcium, manganese, nickel, titanium, copper, phosphorus, magnesium, chromium, vanadium, cobalt in industrial silicon. The determination range is as shown in Table 1.

2 Normative references

The following documents are essential to the application of this document. For the dated documents, only the versions with the dates indicated are applicable to this document; for the undated documents, only the latest version (including all the amendments) is applicable to this standard.

GB/T 8170 Rules of rounding off for numerical values & expression and judgement of limiting values

3 Method summary

X-ray fluorescence spectrometry is a qualitative and quantitative analysis, by measuring the wavelength and intensity of the X-ray spectral lines, which are emitted by the secondary excitation of chemical elements. The primary X-ray beam, which is generated by the light pipe, is irradiated on the specimen. Each chemical element in the specimen is excited, to emit its own secondary characteristic radiation. This secondary ray reaches the spectroscopic crystal, through the collimator. Only the radiation of a specific wavelength, that satisfies the diffraction conditions, is strengthened when it exits the crystal, the radiation of other wavelengths is weakened. This method is based on Bragg's theorem, namely formula (1):

Where: n - Diffraction order;

lambda - The wavelength of the incident beam (characteristic radiation), in nanometers (nm); d - Spacing between crystal planes, in centimeters (cm);

theta - The angle between the incident light and the crystal plane, in degrees (°).

In quantitative analysis, first measure the analytical line intensity of a series of standard samples; draw a standard curve of intensity versus concentration; perform the necessary mathematical correction for matrix effects; then calculate the element content, according to the intensity of the element spectral lines in the analytical specimen.

4 Instruments and materials

4.1 Wavelength dispersive X-ray fluorescence spectrometer, Rh target light tube (refer to Appendix A, for instrument parameter settings).

4.2 Vibration mill (including tungsten carbide grinding disc).

4.3 Tablet press (including press ring), which can provide 40 t pressure.

4.4 Balance: Sensitivity is 0.1 g.

4.5 Binder: Boric acid or starch (analytical pure).

4.6 Lining agent: Boric acid (industrial pure).

4.7 Triethanolamine (Analytical pure).

5 Specimens

The specimen shall be able to pass through a 0.149 mm standard sieve.

6 Steps

6.1 Sample

Weigh 15.0 g of specimen (5). Add 3.0 g of binder (4.5) and 3 drops of triethanolamine (4.7). Vibrate and grind on the vibrating mill (4.2), until the specimen can pass through a 0.074 mm standard sieve. Place a pad lining agent (4.6) under the bottom or wrap the edge or place it in the pressure ring, which is then put into the tablet press (4.3). The pressure is 30 t. The holding time is 30 s. After the pressure is released, take out the sample. Blow off the surface impurities to prepare for testing. The sample thickness shall not be less than 4 mm.

6.2 Number of measurements

Carry out two measurements independently. Take the average value.

6.3 Instrument calibration

6.3.1 Background correction

One or two backgrounds can optionally be measured, for constant elements.

6.3.2 Instrument drift correction

Correct the instrument drift, by measuring monitored samples.

6.4 Drawing of calibration curve

Select industrial silicon standard samples, to draw a standard curve. Each element shall have a standard series, which have a sufficient content range and a certain gradient. The curve is drawn according to the requirements of the instrument. When drawing, it shall consider the spectral lines of other elements, which may interfere with the spectral lines of each analyzed element. See Appendix B for common interfering element spectral lines. Standard sample is prepared, according to step 6.1; the measurement is carried out, according to 6.5.3.

6.5 Measurement

6.5.1 Preparation

Preheat the X-ray fluorescence spectrometer (4.1), until it is stable. Select working parameters, according to the model of X-ray fluorescence spectrometer.

6.5.2 Measurement of monitored samples

Set the monitored sample name. Measure the X-ray intensity of the analyzed elements in the monitored sample. […]

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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 15 pages — is available in the English PDF.

Referenced standards

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Editions of GB/T 14849.5

EditionTitleRevisionStatus
GB/T 14849.5-2014Methods for chemical analysis of silicon metal—Part 5: Determination of impurity contents—X-ray fluorescence methodcurrent editionCurrent
GB/T 14849.5-2010Methods for chemical analysis of silicon metal—Part 5: Determination of impurity contents—X-ray fluorescence methodprevious editionSuperseded

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