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YS/T 839-2012Test method for measurement of insulator thickness and refractive index on silicon substrates by ellipsometry (English PDF)

硅衬底上绝缘体薄膜厚度及折射率的椭圆偏振测试方法

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Issued by

Ministry of Industry and Information Technology

Level / Type

National · Recommended

Issue date

November 7, 2012

Implementation date

March 1, 2013

Scope

YS/T 839-2012 is the English-translated version of 硅衬底上绝缘体薄膜厚度及折射率的椭圆偏振测试方法.

YS/T 839-2012 — 1.1 The method specifies the insulator film thickness measured by ellipsometry Test grown or deposited on the silicon substrate and the refractive index method.

1.2 test method is applicable to the film and the substrate without absorption wavelength of the light-wavelength testing, and it is known to test the substrate at a wavelength of refraction Measuring the insulator film thickness and refractive index and extinction coefficient.

For non-insulator film, when certain conditions are met before the present method.

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Document preview — YS/T 839-2012

National Standard of the People's Republic of China

ICS
77.120.99
Classification
H 68

Issued by: Ministry of Industry and Information Technology

Contents

  • What this standard covers1
  • Document data2

What this standard covers

This standard specifies test methods using ellipsometry measurements grown or deposited on the silicon substrate insulator film thickness and refractive index method. This standard applies to no absorption wavelength of the test film and the substrate on

Document data

International classification (ICS): 77.120.99.

Chinese classification (CCS): H68.

Estimated length of the Chinese original: 11,169 words.

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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 7 pages — is available in the English PDF.

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