YS/T 666-2008Chemical analysis methods of gallium for industrial use. Determination of impurity elements. Inductively coupled plasma atomic emission spectrometric method (English PDF)

YS/T 666-2008 is the English-translated version of 工业镓化学分析方法杂质元素的测定电感耦合等离子体原子发射光谱法.

YS/T 666-2008 — This standard specifies the silicon, sodium, potassium, magnesium, calcium, aluminum content determination of gallium industry. This standard applies to industrial gallium [99.9% <=omega (%) <=99.995%] silicon, sodium, potassium, magnesium, calcium, aluminum content was measured.

Measurement range Table 1. Table 1 Element measurement range /% Silicon 7 × 10-4 ~ 1 × 10-2 Sodium 5 × 10-4 ~ 1 × 10-2 K 5 × 10-4 ~ 1 × 10-2 Element measurement range /% Magnesium 5 × 10-4 ~ 1 × 10-2 Calcium 5 × 10-4 ~ 1 × 10-2 Aluminum 8 × 10-4 ~ 1 × 10-2

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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 5 pages — is available in the English PDF.

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