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YS/T 540.5-2018Methods for chemical analysis of vanadium - Part 5: Determination of impurity contents -- Inductively coupled plasma atomic emission spectrometry (English PDF)

钒化学分析方法第5部分：杂质元素测定电感耦合等离子体原子发射光谱法

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Issued by

Ministry of Industry and Information Technology

Level / Type

National · Recommended

Issue date

October 22, 2018

Implementation date

April 1, 2019

Scope

YS/T 540.5-2018 is the English-translated version of 钒化学分析方法第5部分：杂质元素测定电感耦合等离子体原子发射光谱法.

YS/T 540.5-2018 — Methods for chemical analysis of vanadium - Part 5: Determination of impurity contents -- Inductively coupled plasma atomic emission spectrometry

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Document preview — YS/T 540.5-2018

National Standard of the People's Republic of China

Classification: H 14
Replacing: YS/T 540.3-2006; YS/T 540.6-2006; YS/T 540.5-2006

Issued by: Ministry of Industry and Information Technology

Document data1

Document data

Chinese classification (CCS): H14.

Estimated length of the Chinese original: 7,778 words.

Supersedes the earlier edition YS/T 540.3-2006; YS/T 540.6-2006; YS/T 540.5-2006.

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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 5 pages — is available in the English PDF.

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