YS/T 15-1991Thcikness determination for silicon epitaxial layer and difussion layer - Angle lap-stain method (English PDF)
硅外延层和扩散层厚度测定 磨角染色法
YS/T 15 | Evolution and historical versions
| Std ID | Title | Status |
|---|---|---|
| YS/T 15-2015 | Test method for thickness of epitaxial layers and diffused layers by angle lap stain | Valid |
| YS/T 15-1991 | Thcikness determination for silicon epitaxial layer and difussion layer - Angle lap-stain method | Obsolete |
YS/T 15-1991 is obsolete. It has been replaced by YS/T 15-2015. This page sells the obsolete edition, for projects and contracts that still cite it.
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Issued by
China National Nonferrous Metals Industry Corporation
Level / Type
National · Recommended
Issue date
April 25, 1991
Implementation date
June 1, 1992
Scope
YS/T 15-1991 is the English-translated version of 硅外延层和扩散层厚度测定 磨角染色法.
YS/T 15-1991 is the Chinese industry standard "Thcikness determination for silicon epitaxial layer and difussion layer - Angle lap-stain method". It was issued on April 25, 1991 by the China National Nonferrous Metals Industry Corporation, and took effect on June 1, 1992. It is obsolete: it has been replaced by YS/T 15-2015.
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Document preview — YS/T 15-1991
National Standard of the People's Republic of China
Issued by: China National Nonferrous Metals Industry Corporation
Contents
- Document data
1 Document data
Sector: National Recommended (industry standard).
Issuing body: China National Nonferrous Metals Industry Corporation.
Date of issue: 1991-04-25.
Date of implementation: 1992-06-01.
Status: obsolete, replaced by YS/T 15-2015.
......
This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — all pages — is available in the English PDF.
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