YS/T 1025-2015High-purity tungsten and tungsten alloy sputtering target used in electronic film (English PDF)
电子薄膜用高纯钨及钨合金溅射靶材
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Issued by
Ministry of Industry and Information Technology
Level / Type
National · Recommended
Issue date
April 30, 2015
Implementation date
October 1, 2015
Scope
YS/T 1025-2015 is the English-translated version of 电子薄膜用高纯钨及钨合金溅射靶材.
YS/T 1025-2015 — This standard specifies the electronic film with high purity tungsten and tungsten alloy sputtering targets requirements, test methods, inspection rules and signs, packaging, transportation Transport, storage, purchase orders (or contract) and so on.
This standard applies to electronic film with high purity tungsten and tungsten alloy sputtering targets, hereinafter referred to as high-purity tungsten and tungsten alloy target.
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Document preview — YS/T 1025-2015
National Standard of the People's Republic of China
- ICS
- 77.150.99
- Classification
- H 63
Issued by: Ministry of Industry and Information Technology
Contents
- What this standard covers1
- Document data2
- Standards quoted by this document3
What this standard covers
This standard specifies the requirements, test methods, inspection rules and marks, packaging, transportation, storage, order form (contract), etc. of high purity tungsten and tungsten alloy sputtering targets for electronic thin films. This standard applies to electronic thin film with high purity tungsten and tungsten alloy shot target, hereinafter referred to as high-purity tungsten and tungsten alloy target.
Document data
International classification (ICS): 77.150.99.
Chinese classification (CCS): H63.
Estimated length of the Chinese original: 10,189 words.
Standards quoted by this document
GB/T 1031; GB/T 1804; GB/T 3850; GB/T 4324.23; GB/T 4324.25; GB/T 4324.26; GB/T 4324.27; GB/T 6394; GB/T 8651; YS/T 837; YS/T 900; YS/T 901
......
This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 7 pages — is available in the English PDF.
Referenced standards
Normative references
- GB/T 1031Geometrical product specifications(GPS) - Surface texture: Profile method - Surface roughness parameters and their values
- GB/T 1804General tolerances - Tolerances for linear and angular dimensions without individual tolerance indications
- GB/T 3850Impermeable sintered metal materials and hard metals -- Determination of density
- GB/T 4324.23Methods for chemical analysis of tungsten - Part 23: Determination of sulfur content - The combustion-conductometric titration and high frequency combustion-infrared absorption method
- GB/T 4324.25Methods for chemical analysis of tungsten - Part 25: Determination of oxygen content - Pulse heating inert gas fusion-infrared absorption method
- GB/T 4324.26Methods for chemical analysis of tungsten - Part 26: Determination of nitrogen content - Pulse heating inert gas fusion-thermal conductive method and the Nessler reagent spectrophotometry
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Related Standards
GB/T 1031-2009 — Geometrical product specifications(GPS) - Surface texture: Profile method - Surface roughness parameters and their values
GB/T 10318-1988 — Phosphor Y20 for low-light-level picturetubes and storage tubes
GB/T 10319-2008 — General specifications for marine pneumatic measurement and control instruments
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