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SJ 3244.5-1989Methods of measurement for compensation degree of Gallium arsenide and Indium phosphide materias (English PDF)

砷化镓和磷化铟材料补偿度的测试方法

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Issued by

Ministry of Industry and Information Technology of PRC

Level / Type

National · Mandatory

Issue date

March 20, 1989

Implementation date

March 25, 1989

Scope

SJ 3244.5-1989 is the English-translated version of 砷化镓和磷化铟材料补偿度的测试方法.

SJ 3244.5-1989 — This standard specifies the gallium arsenide and indium phosphide material to determine the compensation of the measurement principle, the equipment, the test sample preparation and analysis.

This standard applies to the n-type, P-type GaAs and InP epitaxial layer and the high resistance of the substrate, the carrier concentration in the 1 �� 10 ^ 12 ~ 5 �� 10 ^ 15cm ^ -3 semiconductor material scope of test and analysis of compensation degree.

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Document preview — SJ 3244.5-1989

National Standard of the People's Republic of China

Classification: H 83;L90

What this standard covers1
Document data2

What this standard covers

This standard specifies the gallium arsenide and indium phosphide material to determine the compensation of the measurement principle, the equipment, the test sample preparation and analysis. This standard applies to the n-type, P-type GaAs and InP epitaxial layer and the high resistance of the substrate, the carrier concentration in the 1 �� 10 ^ 12 ~ 5 �� 10 ^ 15cm ^ -3 semiconductor material scope of test and analysis of compensation degree. In principle also applies to the measurement and analysis of other III-V compound material compensation degree.

Document data

Chinese classification (CCS): H83;L90.

Estimated length of the Chinese original: 7,799 words.

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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 5 pages — is available in the English PDF.

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