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SJ 20984-2008General specification for chemical vapor deposition(CVD) equipment (English PDF)

化学气相淀积(CVD)设备通用规范

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Issued by

Ministry of Industry and Information Technology

Level / Type

National · Mandatory

Issue date

April 15, 2008

Implementation date

June 30, 2008

Scope

SJ 20984-2008 is the English-translated version of 化学气相淀积(CVD)设备通用规范.

SJ 20984-2008 — This standard specifies the chemical vapor deposition equipment requirements, quality assurance provisions, delivery preparation.

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Document preview — SJ 20984-2008

National Standard of the People's Republic of China

ICS: 31.240
Classification: L 95

Issued by: Ministry of Industry and Information Technology

What this standard covers1
Document data2
Standards quoted by this document3

What this standard covers

This standard specifies the chemical vapor deposition equipment requirements, quality assurance provisions, delivery preparation. This standard applies to the electronics industry in photonics, microelectronics development and production of chemical vapor deposition equipment, and other similar equipment industry can also be implemented by reference.

Document data

International classification (ICS): 31.240.

Chinese classification (CCS): L95.

Estimated length of the Chinese original: 13,166 words.

Standards quoted by this document

GB/T 191; GB/T 5080.7-1986; GB/T 6388; GB/T 5226.1-2002; GB/T 13384-1992; GB/T 37-1996; SJ 1276-1977; SJ/T 10674-1995

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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 9 pages — is available in the English PDF.

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