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SJ 20842-2002Test method for Ga/As ratio of surface of gallium arsenide (English PDF)

砷化镓表面砷镓比的测试方法

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Issued by

Ministry of Industry and Information Technology of PRC

Level / Type

National · Mandatory

Issue date

October 30, 2002

Implementation date

March 1, 2003

Scope

SJ 20842-2002 is the English-translated version of 砷化镓表面砷镓比的测试方法.

SJ 20842-2002 — This standard specifies the ratio of gallium arsenide GaAs surface X-ray photoelectron spectroscopy test methods.

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Document preview — SJ 20842-2002

National Standard of the People's Republic of China

Classification: H 83;L90

What this standard covers1
Document data2

What this standard covers

This standard specifies the ratio of gallium arsenide GaAs surface X-ray photoelectron spectroscopy test methods. This standard applies to GaAs devices for monitoring various surface treatment during the manufacturing process of the gallium arsenide GaAs wafer surface than the impact, but also suitable for wafer processing in a variety of surface treatment.

Document data

Chinese classification (CCS): H83;L90.

Estimated length of the Chinese original: 5,528 words.

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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 4 pages — is available in the English PDF.

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