GB/T 45130-2025Aluminium-doped zinc oxide sputtering targets (English PDF)
氧化锌铝靶材
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Issued by
SAMR; SAC
Level / Type
National · Recommended
Issue date
January 24, 2025
Implementation date
August 1, 2025
Scope
GB/T 45130-2025 is the English-translated version of 氧化锌铝靶材.
China's national standard for aluminium-doped zinc oxide sputtering targets. AZO is the transparent conducting oxide used where indium tin oxide is too expensive to justify - which is to say wherever the area is large. Thin film solar modules need a transparent front electrode over their whole area, and low-emissivity architectural glass needs a conducting coating over whole facades; at those areas the indium price dominates, and AZO made from abundant zinc and aluminium replaces it. The coating is deposited by sputtering from a ceramic target, and the target is what governs the result: its density, its composition uniformity and its grain structure determine the film's resistivity and transparency, and a target with porosity arcs during sputtering and throws particles into the film. The standard covers targets made by mixing ZnO and Al2O3 powders and sintering at atmospheric pressure, specifying classification, technical requirements, test methods, inspection rules and the order contents.
Document preview — GB/T 45130-2025
National Standard of the People's Republic of China
- ICS
- 77.150.60
- Classification
- H 62
Issued by: State Administration for Market Regulation; Standardization Administration of the PRC
Contents
- 1 Scope
- 2 Normative references
- 3 Terms and definitions
- 4 Categories
Foreword
This document is in accordance with the provisions of GB/T 1.1-2020 "Guidelines for standardization work Part
1.Structure and drafting rules for standardization documents" Drafting. Please note that some of the contents of this document may involve patents. The issuing organization of this document does not assume the responsibility for identifying patents. This document was proposed by China Nonferrous Metals Industry Association. This document is under the jurisdiction of the National Technical Committee on Standardization of Nonferrous Metals (SAC/TC243). This document was drafted by: Pioneer Electronic Technology Co., Ltd., Shenzhen Zhongjin Lingnan Nonferrous Metals Co., Ltd., Zhuzhou Torch Antai New Materials Co., Ltd., Wuhu Yingri Technology Co., Ltd., Chengdu Zhongjiancai Optoelectronic Materials Co., Ltd., Shenzhen Zhongjin Lingnan Shaoguan Smelter of Nonferrous Metals Co., Ltd., Guangdong Oulai High-tech Materials Co., Ltd., Hebei Hengbo New Materials Technology Co., Ltd. Co., Ltd., Fujian Ashi Innovation Materials Co., Ltd., Zhongshan Zhilong New Materials Technology Co., Ltd., Shanghai University, Guangdong Pioneer Rare Materials Co., Ltd. company. The main drafters of this document are. Yu Fang, Tong Peiyun, Zhu Zanfang, Yang Ping, Jiang Shaoying, Zeng Dunfeng, Zhou Yi, Cai Zhengming, Li Qingfeng, Chen Wenlin, Ge Chunqiao, Li Xifeng, Zhu Liu, Gao Minyi, Zuo Hongyi, Liu Huiming, Wang Zhiqiang, Li Jiaxuan, Li Peng, Luo Shenglei, Chen Qinzhong, Li Qiang, Zhang Jianhua, Zhang Ke, Zeng Pingsheng, Shi Shilong, Wang Kaikai, and Zhu Yongfeng. Zinc Oxide Aluminum Sputtering Target
1 Scope
China's national standard for aluminium-doped zinc oxide sputtering targets. AZO is the transparent conducting oxide used where indium tin oxide is too expensive to justify - which is to say wherever the area is large. Thin film solar modules need a transparent front electrode over their whole area, and low-emissivity architectural glass needs a conducting coating over whole facades; at those areas the indium price dominates, and AZO made from abundant zinc and aluminium replaces it. The coating is deposited by sputtering from a ceramic target, and the target is what governs the result: its density, its composition uniformity and its grain structure determine the film's resistivity and transparency, and a target with porosity arcs during sputtering and throws particles into the film. The standard covers targets made by mixing ZnO and Al2O3 powders and sintering at atmospheric pressure, specifying classification, technical requirements, test methods, inspection rules and the order contents.
This document specifies the classification, technical requirements, test methods, inspection rules, marking, Packaging, transportation, storage and accompanying documents and order contents. This document is applicable to the zinc oxide aluminum target produced by mixing ZnO and Al2O3 powder in a certain proportion and sintering by normal pressure. Used in thin-film solar cell coating and building energy-saving glass coating.
2 Normative references
The contents of the following documents constitute the essential clauses of this document through normative references in this document. For referenced documents without a date, only the version corresponding to that date applies to this document; for referenced documents without a date, the latest version (including all amendments) applies to This document.
GB/T 1551 Determination of resistivity of silicon single crystals - In-line four-probe method and DC two-probe method
GB/T 3850 Density determination method for dense sintered metal materials and cemented carbides
GB/T 6569 Test method for bending strength of fine ceramics
GB/T 8170 Rules for rounding off values and expression and determination of limit values
GB/T 13298 Metal microstructure inspection methods SL499 Standard Test Method for Residual Stress Measurement by Hole Drilling Strain Method YS/T 837 Ultrasonic testing method for sputtering target-backing plate bonding quality
3 Terms and definitions
The following terms and definitions apply to this document.
3.1 apparent density The mass of a substance per unit volume.
3.2 relative density The ratio of apparent density to theoretical density.
Note. When the mass ratio of AZO target is m(ZnO):m(Al2O3)=98:2, the theoretical density of AZO target is calculated as 5.57g/cm3.
4 Categories
AZO targets are divided into planar targets and tubular targets according to their shapes; and are specified as one grade according to the mass ratio of ZnO and Al2O3.AZO98.
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This preview omits tables, figures, formulas and parts of the technical clauses. The complete document — 17 pages — is available in the English PDF.
Referenced standards
Normative references
- GB/T 1551Test method for measuring resistivity of monocrystal silicon—In-line four-point probe and direct current two-point probe method
- GB/T 8170Rules of rounding off for numerical values & expression and judgement of limiting values
- GB/T 13298Inspection Methods of Microstructure for Metals
GB/T 3850 · GB/T 6569
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Related Standards
GB/T 13298-2015 — Inspection Methods of Microstructure for Metals
GB/T 1551-2021 — Test method for measuring resistivity of monocrystal silicon—In-line four-point probe and direct current two-point probe method
GB/T 15510-2008 — General rules for reliability test of electromagnetic relay for control circuits
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